Search Results1-18 of  18

  • Kaimoto Yuko ID: 9000009563995

    Articles in CiNii:1

    • Effect of Substrate Treatments on Resist Footing in Chemically Amplified System (1997)
  • KAIMOTO YUKO ID: 9000253032228

    Fujistu Limited 1015 Kamikodanaka (1995 from CiNii)

    Articles in CiNii:1

    • Study of ArF resist material in terms of transparency and dry etch resistance. (1995)
  • KAIMOTO Yuko ID: 9000001655188

    Yokohama Research Center Association of Super-advanced Electronics Technologies (ASET) (1998 from CiNii)

    Articles in CiNii:2

    • Dependence of Line Width on Pattern-Pitch in Chemically Amplified Resist (1996)
    • Top Surface Imaging (TSI) Resist Process (1998)
  • KAIMOTO Yuko ID: 9000005716712

    Articles in CiNii:4

    • Study of High Photo-speed Top Surface Imaging Process Using Chemically Amplified Resist (1998)
    • Silylation for Carboxylic Acids (1998)
    • Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist (1997)
  • KAIMOTO Yuko ID: 9000005716767

    FUJITSU LIMITED (1997 from CiNii)

    Articles in CiNii:1

    • Pitch Dependence of Linewidth in the 0.25μm Patterns Fabricated Using Positive Chemically Amplified Resist (1997)
  • Kaimoto Yuko ID: 9000253028152

    Fujitsu Ltd. (1997 from CiNii)

    Articles in CiNii:1

    • Effect of Substrate Treatments on Resist Footing in Chemically Amplified System. (1997)
  • Kaimoto Yuko ID: 9000253028250

    Association of Super-Advanced Electronics Technologies (ASET) (1997 from CiNii)

    Articles in CiNii:1

    • Diffusion Kinetic of Vapor-phase Silylation Process for ArF Lithography. (1997)
  • Kaimoto Yuko ID: 9000253028262

    Association of Super-Advanced Electronics Technologies (ASET) (1997 from CiNii)

    Articles in CiNii:1

    • Chemically Amplified Si-contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and its Application to Bi-Layer Resist Process. (1997)
  • Kaimoto Yuko ID: 9000253028741

    Association of Super-advanced Electronics Technologies (ASET) (1998 from CiNii)

    Articles in CiNii:1

    • Bilayer resists process for ArF lithography. (1998)
  • Kaimoto Yuko ID: 9000253028766

    Association of Super-Advanced Electronics Technologies (ASST) 292 Yoshida-cho (1998 from CiNii)

    Articles in CiNii:1

    • Silylation for Carboxylic Acids. (1998)
  • Kaimoto Yuko ID: 9000253028775

    Yokohama Research Center, Association of Super-advanced Electronics Technologies 292 Yoshida-cho (1998 from CiNii)

    Articles in CiNii:1

    • Theoretical and Experimental Study on the Silylation of Alcohol Units in ArF Lithography Resists. (1998)
  • Kaimoto Yuko ID: 9000253028780

    Yokohama Research Center, Association of Super-Advanced Electronics Technologies (ASET) 292 (1998 from CiNii)

    Articles in CiNii:1

    • Study of high photo-speed top surface imaging process using chemically amplified resist. (1998)
  • Kaimoto Yuko ID: 9000253031838

    Fujitsu Limited (1994 from CiNii)

    Articles in CiNii:1

    • Lithographic characteristics of alicyclic polymer based ArF single layer resists. (1994)
  • Kaimoto Yuko ID: 9000258134631

    4–1–1 Kamikodanaka, Nakahara–ku, Kawasaki, Kanagawa 211, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Pitch Dependence of Linewidth in the 0.25.MU.m Patterns Fabricated Using Positive Chemically Amplified Resist. (1997)
  • Kaimoto Yuko ID: 9000258134715

    Fujitsu Limited, 4–1–1 Kamikodanaka, Nakahara–ku, Kawasaki 211–88, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist. (1997)
  • Kaimoto Yuko ID: 9000401668088

    Articles in CiNii:1

    • Post-Exposure-Bake Simulation Model with Constant Acid Loss of Chemically Amplified Resist (1997)
  • Kaimoto Yuko ID: 9000401668110

    Articles in CiNii:1

    • 1997-12-30 (1997)
  • Kaimoto Yuko ID: 9000401675720

    Articles in CiNii:1

    • 1998-12-30 (1998)
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