Search Results1-20 of  55

  • 1 / 3
  • KAMIMURA Tomosumi ID: 9000001495861

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Developments of Multilayer Resist Technology for the Halftone Mask (2005)
  • KAMIMURA Tomosumi ID: 9000001673836

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266nm) (2005)
  • KAMIMURA Tomosumi ID: 9000005544025

    Advanced Technology R&D Center, Mitsubishi Electric Corporation (2005 from CiNii)

    Articles in CiNii:9

    • Laser-Induced Bulk Damage of Various Types of Silica Glasses at 532 and 355nm (2004)
    • Laser-Induced Bulk Damage of Various Types of Silica Glasses at 266nm (2004)
    • 355-nm UV Light Generation in High-Quality CsB_3O_5 Fabricated by Post-Growth Heat Treatment (2005)
  • KAMIMURA Tomosumi ID: 9000107325667

    Department of Electronics Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Electrical Conductivity of Polymer Composites Filled with Carbon Black (2005)
  • KAMIMURA Tomosumi ID: 9000107341432

    Department of Electronics Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Electrical Conductivity of Polymer Composites Filled with Metal (2005)
  • KAMIMURA Tomosumi ID: 9000107343169

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Characterization of Two-Photon Absorption Related to the Enhanced Bulk Damage Resistance in CsLiB_6O_<10> Crystal (2005)
  • KAMIMURA Tomosumi ID: 9000107348157

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2004 from CiNii)

    Articles in CiNii:1

    • Enhancement of Surface-Damage Resistance by Removing Subsurface Damage in Fused Silica and Its Dependence on Wavelength (2004)
  • KAMIMURA Tomosumi ID: 9000107351021

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2007 from CiNii)

    Articles in CiNii:1

    • Effect of Crystal Defects on Laser-Induced-Damage Tolerance of Organic Crystal, 4-Dimethylamino-N-methyl-4-stilbazolium Tosylate (2007)
  • KAMIMURA Tomosumi ID: 9000253698177

    Department of Electrical Engineering, Osaka University (1999 from CiNii)

    Articles in CiNii:1

    • High Damage Resistivity of Optical Surface for UV Lasers by Ion Beam Etching. (1999)
  • KAMIMURA Tomosumi ID: 9000254401001

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Developments of Multilayer Resist Technology for the Halftone Mask (2005)
  • KAMIMURA Tomosumi ID: 9000257901567

    Department of Electrical Engineering, Osaka University (2002 from CiNii)

    Articles in CiNii:1

    • Crystal Growth Technique for High-Quality CsLiB6O10 (CLBO) Crystal for Use in High-Power UV Generation. (2002)
  • KAMIMURA Tomosumi ID: 9000257902081

    Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Laser-Induced Damage of Anti-Reflection Coating for Optical Guide of YAG Laser (2005)
  • KAMIMURA Tomosumi ID: 9000273026228

    Articles in CiNii:1

    • Resist Removal by Laser Irradiation and Adhesion between Resist and Substrate (2005)
  • Kamimura Tomosumi ID: 9000071383847

    Articles in CiNii:1

    • Dependences of Laser-Induced Bulk Damage Threshold and Crack Patterns in Several Nonlinear Crystals on Irradiation Direction (2006)
  • Kamimura Tomosumi ID: 9000257752711

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2005 from CiNii)

    Articles in CiNii:1

    • Removal of Diazonaphthoquinone/Novolak Resist Using UV Laser (266 nm) (2005)
  • Kamimura Tomosumi ID: 9000257897054

    Department of Electronics, Information and Communication Engineering, Osaka Institute of Technology (2007 from CiNii)

    Articles in CiNii:1

    • Resist Removal by using Wet Ozone (2007)
  • Kamimura Tomosumi ID: 9000258142788

    Department of Electrical Engineering, Osaka University, 2–1 Yamada oka, Suita, Osaka 565–0871, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Ion Etching of Fused Silica Glasses for High-Power Laserss. (1998)
  • Kamimura Tomosumi ID: 9000258145766

    Department of Electrical Engineering, Osaka University, 2–1 Yamada–oka, Suita, Osaka 565–0871, Japan (1999 from CiNii)

    Articles in CiNii:1

    • Bulk Laser Damage in CsLiB6O10 Crystal and Its Dependence on Crystal Structure. (1999)
  • Kamimura Tomosumi ID: 9000258146305

    Department of Electrical Engineering, Osaka University, 2–1 Yamada oka, Suita, Osaka 565–0871, Japan (1999 from CiNii)

    Articles in CiNii:1

    • Effect of RF Plasma Etching on Surface Damage in CSLiB6O10 Crystal. (1999)
  • Kamimura Tomosumi ID: 9000258155414

    Department of Electrical Engineering, Osaka University, 2-1 Yamada-oka, Suita, Osaka 565-0871, Japan (2001 from CiNii)

    Articles in CiNii:1

    • Influence of Crystallinity on the Bulk Laser-Induced Damage Threshold and Absorption of Laser Light in CsLiB6O10 Crystals. (2001)
  • 1 / 3
Page Top