Search Results1-8 of  8

  • IZUMI Koichi ID: 9000005541561

    National Institute for Materials Science (2006 from CiNii)

    Articles in CiNii:12

    • GeO Desorption in Reactive Scattering of an Oxygen Molecular Beam with a Ge(100)Surface (1997)
    • Time Domain Interferometry in X-Ray Region Using Nuclear Resonant Scattering (1995)
    • Interference of Nuclear Bragg Scattered X-Rays in X-Ray Interferometer with Large Optical Path Difference (1995)
  • KAMIOKA Isao ID: 9000001195070

    Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation (2003 from CiNii)

    Articles in CiNii:1

    • Characteristics of O(^3P) Density in O_2 and Kr Gas Mixture Remote Plasma Oxidation of Silicon Measured by Two-Photon Absorption Laser-Induced Fluorescence (2003)
  • KAMIOKA Isao ID: 9000253648732

    Institute of Physics, University of Tsukuba (1995 from CiNii)

    Articles in CiNii:1

    • Effect of Oxygen Ions on Plasma Oxidation of Silicon. (1995)
  • Kamioka Isao ID: 9000258139691

    National Research Institute for Metals, 1–2–1 Sengen, Tsukuba, Ibaraki 305, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Translational Energy Distribution of CO Produced in Infrared-Laser-Assisted Reaction of O2 with a Graphite Surface. (1998)
  • Kamioka Isao ID: 9000258164673

    Advanced LSI Technology Laboratory, Corporate Research & Development Center, Toshiba Corporation (2003 from CiNii)

    Articles in CiNii:1

    • Characteristics of O(3P) Density in O2 and Kr Gas Mixture Remote Plasma Oxidation of Silicon Measured by Two-Photon Absorption Laser-Induced Fluorescence (2003)
  • Kamioka Isao ID: 9000401664384

    Articles in CiNii:1

    • GeO Desorption in Reactive Scattering of an Oxygen Molecular Beam with a Ge(100) Surface (1997)
  • Kamioka Isao ID: 9000401678115

    Articles in CiNii:1

    • Translational Energy Distribution of CO Produced in Infrared-Laser-Assisted Reaction of O2 with a Graphite Surface (1998)
  • Kamioka Isao ID: 9000401722209

    Articles in CiNii:1

    • Characteristics of O(3P) Density in O2and Kr Gas Mixture Remote Plasma Oxidation of Silicon Measured by Two-Photon Absorption Laser-Induced Fluorescence (2003)
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