Search Results1-8 of  8

  • KAWAMOTO Hideaki ID: 9000005553462

    ULSI Device Development Laboratories, NEC Corporation (1998 from CiNii)

    Articles in CiNii:3

    • A Reliable Double Level Interconnection Technology for Giga Bit DRAMs Using SiO_2 Mask Al Etching and PECVD SiOF (1997)
    • A 0.7-μm-Pitch Double Level Al Interconnection Technology for 1-Gbit DRAMs using SiO_2 Mask Al Etching and Plasma Enhanced Chemical Vapor Deposition SiOF (1998)
    • Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with In-situ XPS Measurement : Etching and Deposition Technology : (1991)
  • KAWAMOTO Hideaki ID: 9000006001552

    NEC Electronics Corporation (2006 from CiNii)

    Articles in CiNii:1

    • Improved Sub-10-nm CMOS Devices with Elevated Source/Drain Extensions by Tunneling Si-Selective-Epitaxial-Growth (2006)
  • KAWAMOTO Hideaki ID: 9000014140310

    Department of Electronic Engineering, Faculty of Engineering, Gunma University (2008 from CiNii)

    Articles in CiNii:1

    • Experimental evaluation of self-trapping of micro bubbles to the target surface using pumping ultrasonic wave (2008)
  • Kawamoto Hideaki ID: 9000002435123

    鳥取県立鳥取養護学校中学部主事 (1976 from CiNii)

    Articles in CiNii:3

    • A Study on the Effects of Accident-Proneness Preestimate and Safety Education on Children : A Diagnosis Chiefly Based on an Accident : Proneness Preestimate Examination (1974)
    • A Study on the Personal Concerns as Found in High-School Students and Their Consciousness of the Problem Solution by Consultation (1974)
    • A Study of the Pupils Health Condition with Special Reference to Health Maintenance : A Comparative Study between Urban Pupils' and Country Pupils' Lives (1976)
  • Kawamoto Hideaki ID: 9000252972309

    Department of Electrical engineering, Hiroshima University (1990 from CiNii)

    Articles in CiNii:1

    • Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with <I>In-situ</I> XPS Measurement (1990)
  • Kawamoto Hideaki ID: 9000392714675

    Articles in CiNii:1

    • Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition with <I>In-situ</I> XPS Measurement (1990)
  • Kawamoto Hideaki ID: 9000401617518

    Articles in CiNii:1

    • Study on Reaction Mechanism of Aluminum Selective Chemical Vapor Deposition withIn-situXPS Measurement (1990)
  • Kawamoto Hideaki ID: 9000401670610

    Articles in CiNii:1

    • 1998-03-30 (1998)
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