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  • KOMURA Kazuo ID: 9000004964792

    Mitsui Chemicals, Inc. (2008 from CiNii)

    Articles in CiNii:3

    • Development of Mesoporous Silica Films for Ultra Low-k Interlayer Dielectrics (2005)
    • Novel Self-Assembled Ultra-Low-k Porous Silica Films with High Mechanical Strength for 45nm BEOL Technology (2004)
    • 32nm node Ultralow-k(k=2.1)/Cu Damascene Multilevel Interconnect using High-Porosity (50%) High-Modulus (9GPa) Self-Assembled Porous Silica (2008)
  • Komura Kazuo ID: 9000253280040

    Electrotechnical Laboratory, Ministry of International Trade and Industry (1978 from CiNii)

    Articles in CiNii:1

    • Magnetic Instability of Superconducting Wire in the Changing Magnetic Field (1978)
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