Search Results1-20 of  113

  • KOMURO MASANORI ID: 9000000677095

    (独)新エネルギー・産業技術総合開発機構 電子・材料・ナノテクノロジー部 (2012 from CiNii)

    Articles in CiNii:3

    • 第14回マイクロプロセス・ナノ工学国際会議報告 (2002)
    • 第4回ナノインプリント・ナノプリント技術国際会議報告 (2006)
    • 微細構造形成技術の新展開 (2012)
  • KOMURO Masanori ID: 9000002957257

    産総研 (2003 from CiNii)

    Articles in CiNii:8

    • Microfabrication Technology Using FIB (1992)
    • Next-Generation Lithography Technique Using Mold Pressuring (2002)
    • Present Status of Focused Ion Beam (1995)
  • KOMURO Masanori ID: 9000003284059

    Department of Applied Physics, Waseda University (1972 from CiNii)

    Articles in CiNii:1

    • Contrast reversal of Kikuchi bands in transmission electron diffraction (1972)
  • KOMURO Masanori ID: 9000005545926

    Advanced Semiconductor Research Center; National Institute of Advanced Industrial Science and Technology, AIST Tsukuba Central 2 (2002 from CiNii)

    Articles in CiNii:20

    • Dual Function of Thin MoO_3 and WO_3 Films as Negative and Positive Resists for Focused Ion Beam Lithography (1996)
    • Focused Ion Beam Lithography with Transition Metal Oxide Resists : Lithography Technology : (1989)
    • Fundamental Characteristic of Capillary-Type Cluster Ion Source and Its Application for Selective Deposition of Aluminum Film : Etching and Deposition Technology : (1991)
  • KOMURO Masanori ID: 9000005716894

    Electrotechnical Laboratory (1997 from CiNii)

    Articles in CiNii:1

    • High Growth Rate for Slow Scanning in Electron-Baem-Induced Deposition (1997)
  • KOMURO Masanori ID: 9000018442497

    Articles in CiNii:1

    • Present State of Focused-Ion-Beam Technology (2003)
  • KOMURO Masanori ID: 9000020124483

    Flectrotechnical Laboratory (1982 from CiNii)

    Articles in CiNii:1

    • Field Emission Liquid Metal Ion Source (1982)
  • KOMURO Masanori ID: 9000020714815

    Articles in CiNii:1

    • STM applications for microelectronics. (1987)
  • KOMURO Masanori ID: 9000045506886

    Department of Applied Physics, Waseda University (1973 from CiNii)

    Articles in CiNii:1

    • Simple Electron Monochromator of Three-Diaphragm Einzel Lens (1973)
  • KOMURO Masanori ID: 9000107349812

    MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST) (2004 from CiNii)

    Articles in CiNii:1

    • Fabrication of Low Line Edge Roughness Mold for Photo-Nanoimprint (2004)
  • KOMURO Masanori ID: 9000107349962

    MIRAI, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST) (2004 from CiNii)

    Articles in CiNii:1

    • Step-and-Repeat Photo-Nanoimprint System Using Active Orientation Head (2004)
  • KOMURO Masanori ID: 9000107349972

    MIRAI, Advanced Semiconductor Research Center, National Institute of Advanced Industrial Science and Technology (2004 from CiNii)

    Articles in CiNii:1

    • Reducing Photocurable Polymer Pattern Shrinkage and Roughness during Dry Etching in Photo-Nanoimprint Lithography (2004)
  • KOMURO Masanori ID: 9000107349982

    Advanced Semiconductor Research Center, AIST (2004 from CiNii)

    Articles in CiNii:1

    • Bilayer Resist Method for Room-Temperature Nanoimprint Lithography (2004)
  • KOMURO Masanori ID: 9000107364604

    高エネルギー加速器研究機構 (2012 from CiNii)

    Articles in CiNii:1

    • Landscape of Nanoimprint Technology (2012)
  • KOMURO Masanori ID: 9000107374749

    Oita Industrial Research Institute (2005 from CiNii)

    Articles in CiNii:1

    • Fabrication of Low Line Edge Roughness Mold by Spin On Glass (SOG) Replica Method (2005)
  • KOMURO Masanori ID: 9000107374755

    Oita Industrial Research Institute (2005 from CiNii)

    Articles in CiNii:1

    • Line Width Reproducibility of Photo-Nanoimprints (2005)
  • KOMURO Masanori ID: 9000107377686

    MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST) (2003 from CiNii)

    Articles in CiNii:1

    • Elimination of Pattern Defects of Nanoimprint under Atmospheric Conditions (2003)
  • KOMURO Masanori ID: 9000107378056

    MIRAI Project, Advanced Semiconductor Research Center (ASRC), National Institute of Advanced Industrial Science and Technology (AIST) (2003 from CiNii)

    Articles in CiNii:1

    • Evaluation of Line Edge Roughness in Nanoimprint Lithography Using Photocurable Polymer (2003)
  • KOMURO Masanori ID: 9000252844820

    Electrotechnical Laboratory. (1984 from CiNii)

    Articles in CiNii:1

    • Energy Distribution (1984)
  • KOMURO Masanori ID: 9000252844991

    Electrotechnical Laboratory. (1986 from CiNii)

    Articles in CiNii:1

    • Nanometer Structure Fabrication by Electron and Ion-Beam (1986)
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