Search Results1-8 of  8

  • Kamimura Sou ID: 9000010400503

    Articles in CiNii:1

    • Reduction of the outgassing segments and LWR improvement for the next generation EUV lithography (2007)
  • Kamimura Sou ID: 9000010553283

    Articles in CiNii:1

    • A resist material study for LWR and resolution improvement in EUV lithography (2008)
  • Kamimura Sou ID: 9000010734736

    Articles in CiNii:1

    • Materials and processes of negative tone development for double patterning process (2009)
  • Kamimura Sou ID: 9000257897221

    R&D management headquarter, Electronic Material Research Laboratories, FUJIFILM Corporation (2007 from CiNii)

    Articles in CiNii:1

    • Reduction of the Outgassing Segments and LWR Improvement for the Next Generation EUV Lithography (2007)
  • Kamimura Sou ID: 9000257897701

    Electronic Materials Research Laboratories, FUJIFILM Corporation (2008 from CiNii)

    Articles in CiNii:1

    • A Resist Material Study for LWR and Resolution Improvement in EUV Lithography (2008)
  • Kamimura Sou ID: 9000257898310

    Electronic Materials Research Laboratories, R&D management headquarters, FUJIFILM Corporation (2009 from CiNii)

    Articles in CiNii:1

    • Materials and Processes of Negative Tone Development for Double Patterning Process (2009)
  • Kamimura Sou ID: 9000283312723

    FUJI PHOTO FILM Co.Ltd, R&D management headquarter, Semiconductor Material Research Laboratories (2006 from CiNii)

    Articles in CiNii:1

    • Reduction of the Outgassing Segment in Acetal based Chemically Amplified Resist for EUV Lithography (2006)
  • Kamimura Sou ID: 9000283313852

    Electronic Materials Research Laboratories, R&D management headquarters, FUJIFILM Corporation (2011 from CiNii)

    Articles in CiNii:1

    • High Volume Manufacturing Capability of Negative Tone Development Process (2011)
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