Search Results1-20 of  45

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  • Kanamori Jun ID: 9000314400524

    Articles in CiNii:1

    • Diaphragmatic herniation after thoracolaparoscopic esophagectomy for carcinoma of the esophagus : a report of six cases (2016)
  • Jun Kanamori ID: 9000347385741

    Articles in CiNii:1

    • A study on planned soccer stadium development and its associated problems : From a viewpoint of JFA's perspective and "Stadium Guidelines" (2016)
  • KANAMORI Jun ID: 9000000166538

    SUNCOH Consultant Co. (1998 from CiNii)

    Articles in CiNii:1

    • Seismic Reflection Prospecting in Hachiro-gata Reclaimed Land (1)P-wave Prospecting and Synthetic Interpretation (1998)
  • KANAMORI Jun ID: 9000001506133

    VLSI R&D Center, Oki Electric Industry Co., Ltd. (2001 from CiNii)

    Articles in CiNii:1

    • Ultra-High Selectivity Sidewall-Spacer Etching and Contact Hole Etching Technologies for 0.1μm FD-SOI Devices (2001)
  • KANAMORI Jun ID: 9000001719818

    VLSI Research Center, Oki Electric Industry, Co., Ltd. (2000 from CiNii)

    Articles in CiNii:1

    • Optimization of Selective Epitaxy Process for Elevated Source/Drain Applicable to 0.15μm Fully Depleted CMOS on 25nm SOI (2000)
  • KANAMORI Jun ID: 9000001719821

    Oki Electric Industry Co. Ltd., VLSI Research Center (2000 from CiNii)

    Articles in CiNii:1

    • Advanced Co Salicide Technology for Sub-0.20μm FD-SOI Devices (2000)
  • KANAMORI Jun ID: 9000004966638

    VLSI R & D Center, Oki Electric Industry Co., Ltd. (1999 from CiNii)

    Articles in CiNii:5

    • A study of CD variation factors on chemically amplified resist (1995)
    • Study of changes in etching characteristics with a lapse of time in a fluorocarbon ECR plasma (1995)
    • Charge-up measurements during ashing process (1993)
  • KANAMORI Jun ID: 9000005545861

    VLSI Research and Development Center, Oki Electric Industry Co., Ltd. (1998 from CiNii)

    Articles in CiNii:8

    • Vertical Profile Control in Ultrahigh-Aspect-Ratio Contact Hole Etching with 0.05-μm-Diameter Range (1998)
    • Fine Contact Hole Etching in Magneto-Microwave Plasma (1994)
    • Roles of Ions and Radicals in Silicon Oxide Etching : Etching and Deposition Technology : (1991)
  • KANAMORI Jun ID: 9000005734029

    VLSI R&D Center, Oki Electric Industry Co., Ltd. (1995 from CiNii)

    Articles in CiNii:1

    • Role of Oxygen in Poly-Si Etching by Cl_2/O_2 Plasmas (1995)
  • KANAMORI Jun ID: 9000006449469

    Department of General and Enterological Surgery, Kasugai City Hospital (2008 from CiNii)

    Articles in CiNii:13

    • A CASE OF SYNCHRONOUS AND SIMPLE PANCREATIC METASTASIS OF RENAL CELL CARCINOMA (2007)
    • CALCIFYING FIBROUS PSEUDOTUMOR OF MESOCOLON TRANSVERSUM PRESENTING WITH PERITONITIS (2008)
    • 80才以上高齢者全身麻酔手術500例の検討 : 待期手術の適応を中心として (2007)
  • KANAMORI Jun ID: 9000006697607

    Yamagata University (1996 from CiNii)

    Articles in CiNii:1

    • 54 Lithostratigraphy and diatom age of the Hongo Formation in the western margin of Yamagata Basin (1996)
  • KANAMORI Jun ID: 9000255705272

    Department of Industrial Chemistry, Fuculty of Engineering, Shizuoka University (1976 from CiNii)

    Articles in CiNii:1

    • Thermal Behavior of Hydrous Stannic Dioxide (1976)
  • KANAMORI Jun ID: 9000258105603

    Department of General and Enterological Surgery, Kasugai City Hospital (2007 from CiNii)

    Articles in CiNii:1

    • A CASE OF SYNCHRONOUS AND SIMPLE PANCREATIC METASTASIS OF RENAL CELL CARCINOMA (2007)
  • KANAMORI Jun ID: 9000258108014

    Department of General and Enterological Surgery, Kasugai City Hospital (2008 from CiNii)

    Articles in CiNii:1

    • CALCIFYING FIBROUS PSEUDOTUMOR OF MESOCOLON TRANSVERSUM PRESENTING WITH PERITONITIS (2008)
  • Kanamori Jun ID: 9000006654543

    Articles in CiNii:1

    • A study of the change of soccer stadium: mainly on the theory of J. Bale (2008)
  • Kanamori Jun ID: 9000252762132

    VLSI R & D Center, Electronic Devices Group, OKI Electric Industry Co., Ltd. (1990 from CiNii)

    Articles in CiNii:1

    • Roles of Ions and Radicals in Silicon Oxide Etching (1990)
  • Kanamori Jun ID: 9000252977270

    VLSI R & D Center, Electronic Devices Group, OKI Electric Industry Co., Ltd. (1991 from CiNii)

    Articles in CiNii:1

    • Mechanisms of High PSG/SiO<SUB>2</SUB> Selective Etching in a Highly Polymerized Fluorocarbon Plasma (1991)
  • Kanamori Jun ID: 9000252981830

    VLSI R & D Center, Electronic Devices Group, OKI Electric Industry Co., Ltd. (1992 from CiNii)

    Articles in CiNii:1

    • Mechanisms of Surface Reaction in Fluorocarbon Dry Etching of Silicon Dioxide—An Effect of Thermal Excitation (1992)
  • Kanamori Jun ID: 9000252985167

    VLSI R&D Center, Electronic Devices Group, Oki Electric Industry Co., Ltd. (1993 from CiNii)

    Articles in CiNii:1

    • Role of Fluorine in Reactive Ion Etching of Silicon Dioxide (1993)
  • Kanamori Jun ID: 9000256638771

    Department of Surgery, Kasugai Municipal Hospital (2008 from CiNii)

    Articles in CiNii:1

    • A Resected Case of Adenosquamous Cell Carcinoma of the Pancreas with Colonic Obstruction (2008)
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