Search Results1-10 of  10

  • KAWAMURA Seiichiro ID: 9000000226213

    Fujitsu Ltd.CMOS Process Development Division (1996 from CiNii)

    Articles in CiNii:1

    • Advantages of Ultra-Thin SIMOX/CMOS based on Well-Established 0.8 μm Mass-Production Technologies for Low Power 1 V Phase Locked Loop Circuits (1996)
  • KAWAMURA Seiichiro ID: 9000000534266

    産業技術総合研究所次世代半導体研究センター (2001 from CiNii)

    Articles in CiNii:3

    • 半導体MIRAIプロジェクト (2001)
    • Semiconductor Technology Trends and Challenges in the New Millennium (2001)
    • 次世代半導体技術開発の課題と「半導体MIRAIプロジェクト」の概要 (超LSI製造・試験装置ガイドブック 2002年版) -- (総論) (2001)
  • KAWAMURA Seiichiro ID: 9000006421055

    沢上中 (2007 from CiNii)

    Articles in CiNii:2

    • 2D-09 学習者の立場にたった, 理科の学びの在り方 : 「日常知」を「科学知」に変換する学び合い(授業研究・学習指導, 日本理科教育学会 第56回全国大会) (2006)
    • ワークショップ理科授業に役立つ実験演習(中学校)(W5,ワークショップ,日本理科教育学会第57回全国大会) (2007)
  • Kawamura Seiichiro ID: 9000002289683

    Articles in CiNii:20

    • 「西方の人」 (1963)
    • 小説における「表現」の問題 (1964)
    • 「神神の微笑」「おぎん」「おしの」など--芥川竜之介の切支丹物について (1960)
  • Kawamura Seiichiro ID: 9000004872242

    ULSI R&D Division, FUJITSU LIMITED (1994 from CiNii)

    Articles in CiNii:1

    • Degradation Mechanisms of Thin Film SIMOX SOI-MOSFET Characteristics : Optical and Electrical Evaluation (Special Issue on Quarter Micron Si Device and Process Technologies) (1994)
  • Kawamura Seiichiro ID: 9000252949810

    Fujitsu Limited (1981 from CiNii)

    Articles in CiNii:1

    • Lateral Epitaxial Growth in Poly-Si Film over SiO<SUB>2</SUB> from Single-Si Seed by Scanning CW Ar Laser Annealing (1981)
  • Kawamura Seiichiro ID: 9000258131968

    Fujitsu Ltd. CMOS Process Development Division, 1015, Kamikodanaka, Nakahara–ku, Kawasaki 211, Japan (1996 from CiNii)

    Articles in CiNii:1

    • Advantages of Ultra-Thin SIMOX/CMOS based on Well-Established 0.8 .MU.m Mass-Production Technologies for Low Power 1 V Phase Locked Loop Circuits. (1996)
  • Kawamura Seiichiro ID: 9000392684919

    Articles in CiNii:1

    • Lateral Epitaxial Growth in Poly-Si Film over SiO<SUB>2</SUB> from Single-Si Seed by Scanning CW Ar Laser Annealing (1981)
  • Kawamura Seiichiro ID: 9000401589196

    Articles in CiNii:1

    • Lateral Epitaxial Growth in Poly-Si Film over SiO2from Single-Si Seed by Scanning CW Ar Laser Annealing (1981)
  • Kawamura Seiichiro ID: 9000401660300

    Articles in CiNii:1

    • 1996-02-28 (1996)
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