Search Results1-20 of  31

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  • Kihara Naoko ID: 9000019000671

    Articles in CiNii:1

    • Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane) (2012)
  • KIHARA NAOKO ID: 9000253031496

    Toshiba Corporation, R & D center, Materials and Devices Laboratory (1993 from CiNii)

    Articles in CiNii:1

    • The effects of polymer undercoats on the pattern profile of chemically amplified resists. (1993)
  • KIHARA NAOKO ID: 9000253032263

    Research and Development Center, Toshiba Corporation (1995 from CiNii)

    Articles in CiNii:1

    • Effect of acid evaporation in chemically amplified resists on insoluble layer formation. (1995)
  • KIHARA NAOKO ID: 9000253032547

    Toshiba Corp., Materials&Devices Research Labs. (1996 from CiNii)

    Articles in CiNii:1

    • High Performance Chemically Amplified Positive Electron-Beam Resist: Optimization of Base Additives for Environmental Stabilization.:OPTIMIZATION OF BASE ADDITIVES FOR ENVIRONMENTAL STABILIZATION (1996)
  • KIHARA Naoko ID: 9000005552181

    Materials & Devices Laboratory, R&D center, Toshiba Corporation (1998 from CiNii)

    Articles in CiNii:5

    • Inhibition and Promotion Efficiency of bis-Phenol Type Dissolution Inhibitors during Development (1997)
    • High Performance Chemically Amplified Positive Electron-Beam Resist:Optimization of Base Additives for Environmental Stabilization (1996)
    • Charge-reducing Effect of Chemically Amplified Resist in Elictron-Beam Lithography (1998)
  • KIHARA Naoko ID: 9000005716754

    Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corporation (1997 from CiNii)

    Articles in CiNii:1

    • Dissolution Inhibitors for 193-nm Chemically Amplified Resists (1997)
  • KIHARA Naoko ID: 9000242096565

    Research and Development Center, Toshiba Corporation (1988 from CiNii)

    Articles in CiNii:1

    • Effects of Accelerators for Epoxy Compounds on the Reliability of IC Encapsulation (1988)
  • KIHARA Naoko ID: 9000391662084

    Research and Development Center, Toshiba Corporation (1988 from CiNii)

    Articles in CiNii:1

    • Effects of Accelerators for Epoxy Compounds on the Reliability of IC Encapsulation (1988)
  • KIHARA Naoko ID: 9000391662921

    Research and Development Center, Toshiba Corporation (1988 from CiNii)

    Articles in CiNii:1

    • Effects of Accelerators for Epoxy Compounds on the Reliability of IC Encapsulation (1988)
  • Kihara Naoko ID: 9000253028166

    Materials and Devices Research Laboratories, Toshiba Corporation (1997 from CiNii)

    Articles in CiNii:1

    • Inhibition and Promotion Efficiency of Bis-phenol Type Dissolution Inhibitors During Development. (1997)
  • Kihara Naoko ID: 9000253028824

    Materials and Devices Research Laboratories, Toshiba Corporation (1998 from CiNii)

    Articles in CiNii:1

    • EB Resist Materials Consist of Catechol Derivatives. (1998)
  • Kihara Naoko ID: 9000253031373

    Toshiba Research and Development Center Chemical Laboratory (1992 from CiNii)

    Articles in CiNii:1

    • Experimental and Theoretical Studies on Electron Beam Induced Acid Generation for Sulfonyl Compounds. (1992)
  • Kihara Naoko ID: 9000253032024

    Materials and Devices Research Laboratories Toshiba Research and Development Center (1994 from CiNii)

    Articles in CiNii:1

    • Molecular Design of Acid Generators for EB and ArF Excimer Laser Exposure Using Molecular Orbital Calculations. (1994)
  • Kihara Naoko ID: 9000257899171

    Corporate Research & Development Center, Toshiba Corporation (2012 from CiNii)

    Articles in CiNii:1

    • Influence of Solvent Vapor Atmospheres to the Self-assembly of Poly(styrene-b-dimethylsiloxane) (2012)
  • Kihara Naoko ID: 9000258125391

    Materials and Devices Research Laboratories, Toshiba Corporation, 1, Komukai Toshiba–cho, Saiwai–ku, Kawasaki 210, Japan (1995 from CiNii)

    Articles in CiNii:1

    • Thermal Decomposition of Dissolution Inhibitor in Chemically Amplified Resist during Prebake Process. (1995)
  • Kihara Naoko ID: 9000258134614

    Materials and Devices Research Laboratories, Research and Development Center, Toshiba Corporation, 1, Komukai Toshiba–cho, Saiwai–ku, Kawasaki 210, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Dissolution Inhibitors for 193-nm Chemically Amplified Resists. (1997)
  • Kihara Naoko ID: 9000259835012

    DSA Research Dept., EUVL Infrastructure Development Center, Inc. (2014 from CiNii)

    Articles in CiNii:1

    • Process Evaluation of Directed Self-assembly Lithography using Simulation Method based on Self-consistent Field Theory (2014)
  • Kihara Naoko ID: 9000309180270

    EUVL Infrastructure Development Center, Inc.,(EIDEC) (2015 from CiNii)

    Articles in CiNii:1

    • A Challenge to the Micro-phase Separation Limit of PS-b-PMMA by Doping with Hydrophilic Materials (2015)
  • Kihara Naoko ID: 9000309180292

    Corporate Research & Development Center, Toshiba Corporation (2015 from CiNii)

    Articles in CiNii:1

    • Fabrication of Nanoparticle Films Applying Directed Self-assembly (2015)
  • Kihara Naoko ID: 9000309180303

    EUVL Infrastructure Development Center, Inc (2015 from CiNii)

    Articles in CiNii:1

    • Vertical Oriented Lamellar Formation of Fluorine- and Silicon-containing Block Copolymers without Neutral Layers (2015)
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