Search Results1-15 of  15

  • KOTANI Norihiko ID: 9000004777957

    Semiconductor Leading Edge Technologies, Inc. (1997 from CiNii)

    Articles in CiNii:4

    • The essence of TCAD and the scheme for its research (1997)
    • The essence of TCAD and the scheme for its research (1997)
    • The essence of TCAD and the scheme for its research (1997)
  • KOTANI Norihiko ID: 9000004779530

    ULSI Development Center, Mitsubishi Electric Corporation (2000 from CiNii)

    Articles in CiNii:18

    • An algorithm of three-dimensional topography simulation and the applications (1993)
    • 半導体製造システムのシステム化技術 (1992)
    • MODELING AND TECHNOLOGY CAD FOR THE SEMICONDUCTOR DEVICES OF NEXT GENERATION (1996)
  • KOTANI Norihiko ID: 9000004779558

    Faculty of Infrastructural Technologies, Hiroshima International University (2004 from CiNii)

    Articles in CiNii:9

    • Operating point analysis with the homotopy method in cluding the modification of initial values. (1994)
    • Compact Modeling of a Flash Memory Cell Including Substrate-Bias-Dependent Hot-Electron Gate Current (2003)
    • Direct Measurement of Stress Dependent Inversion Layer Mobility Using a Novel Test Structure (2004)
  • KOTANI Norihiko ID: 9000004875036

    Advanced Technology Research Department, Semiconductor Leading Edge Technologies,Inc., (1999 from CiNii)

    Articles in CiNii:1

    • Design and Development of 3-Dimensional Process Simulator (1999)
  • KOTANI Norihiko ID: 9000005546111

    ULSI Research and Development Center, Mitsubishi Electric Corporation (2000 from CiNii)

    Articles in CiNii:2

    • Stable Solution Method for Viscoelastic Oxidation Including Stress-Dependent Viscosity (1996)
    • Simulation of Dopant Redistribution During Gate Oxidation Including Transient - Enhanced Diffusion Caused by Implantation Damage (2000)
  • Kotani Norihiko ID: 9000009905133

    Articles in CiNii:20

    • 凸面布目平瓦の製作技法とその系譜-大和盆地出土例を中心として- (2001)
    • Archaeology : A Tentative Theory on Jyukomon Flat Eaves-end Tile in the Asuka Area (2014)
    • One instance example about the reuse of the roof tile in the castle : Mizuguchi Okayama-jo Castle as a base material (2018)
  • Kotani Norihiko ID: 9000391546085

    LSI Research and Development Laboratory Mitsubishi Electric Corporation (1987 from CiNii)

    Articles in CiNii:1

    • Application of VLSI Simulation to Fabrication Process (1987)
  • Kotani Norihiko ID: 9000392692361

    Articles in CiNii:1

    • Device Modeling for Recessed Oxide Isolation in Bipolar LSIs (1983)
  • Kotani Norihiko ID: 9000392720422

    Articles in CiNii:1

    • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask (1992)
  • Kotani Norihiko ID: 9000392725538

    Articles in CiNii:1

    • Charge Collection Control Using Retrograde Well Tested by Proton Microprobe Irradiation (1993)
  • Kotani Norihiko ID: 9000401592740

    Articles in CiNii:1

    • Device Modeling for Recessed Oxide Isolation in Bipolar LSIs (1983)
  • Kotani Norihiko ID: 9000401629881

    Articles in CiNii:1

    • Photolithography System Using a Combination of Modified Illumination and Phase Shift Mask (1992)
  • Kotani Norihiko ID: 9000401637324

    Articles in CiNii:1

    • Charge Collection Control Using Retrograde Well Tested by Proton Microprobe Irradiation (1993)
  • Kotani Norihiko ID: 9000401657851

    Articles in CiNii:1

    • Stable Solution Method for Viscoelastic Oxidation Including Stress-Dependent Viscosity (1996)
  • Kotani Norihiko ID: 9000401688852

    Articles in CiNii:1

    • Simulation of Dopant Redistribution During Gate Oxidation Including Transient-Enhanced Diffusion Caused by Implantation Damage (2000)
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