Search Results1-13 of  13

  • KUHARA Koichi ID: 9000005557176

    Yokohama Research Center, Association of Super-Advanced Electronics Technologies:(Present address) Semiconductor Leading Edge Technologies, Inc. (1998 from CiNii)

    Articles in CiNii:2

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing and Admantyl Unit (1998)
    • Sub-0.1-μm-Pattern Fabrication Using a 193-nm Top Surface Imaging (TSI) Process (1998)
  • Kuhara Koichi ID: 9000253028253

    Association of Super-Advanced Electronics Technologies (ASET) (1997 from CiNii)

    Articles in CiNii:1

    • Diffusion Kinetic of Vapor-phase Silylation Process for ArF Lithography. (1997)
  • Kuhara Koichi ID: 9000253028264

    Association of Super-Advanced Electronics Technologies (ASET) (1997 from CiNii)

    Articles in CiNii:1

    • Chemically Amplified Si-contained Resist Using Silsesquoxane for ArF Lithography (CASUAL) and its Application to Bi-Layer Resist Process. (1997)
  • Kuhara Koichi ID: 9000253028744

    Association of Super-advanced Electronics Technologies (ASET) (1998 from CiNii)

    Articles in CiNii:1

    • Bilayer resists process for ArF lithography. (1998)
  • Kuhara Koichi ID: 9000253028757

    Association of Super-Advanced Electronics Technologies (ASST) 292 (1998 from CiNii)

    Articles in CiNii:1

    • Advanced Surface Modification Resist Process for ArF Lithography. (1998)
  • Kuhara Koichi ID: 9000253028769

    Association of Super-Advanced Electronics Technologies (ASST) 292 Yoshida-cho (1998 from CiNii)

    Articles in CiNii:1

    • Silylation for Carboxylic Acids. (1998)
  • Kuhara Koichi ID: 9000253028776

    Yokohama Research Center, Association of Super-advanced Electronics Technologies 292 Yoshida-cho (1998 from CiNii)

    Articles in CiNii:1

    • Theoretical and Experimental Study on the Silylation of Alcohol Units in ArF Lithography Resists. (1998)
  • Kuhara Koichi ID: 9000253028784

    Yokohama Research Center, Association of Super-Advanced Electronics Technologies (ASET) 292 (1998 from CiNii)

    Articles in CiNii:1

    • Study of high photo-speed top surface imaging process using chemically amplified resist. (1998)
  • Kuhara Koichi ID: 9000258138639

    Yokohama Research Center, Association of Super–Advanced Electronics Technologies, 292 Yoshida–cho, Totsuka–ku, Yokohama 244–0817, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit. (1998)
  • Kuhara Koichi ID: 9000392719360

    Articles in CiNii:1

    • Study on Electrically Plastic Devices Made with Electropolymerized Films (1991)
  • Kuhara Koichi ID: 9000401621708

    Articles in CiNii:1

    • Study on Electrically Plastic Devices Made with Electropolymerized Films (1991)
  • Kuhara Koichi ID: 9000401674904

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit (1998)
  • Kuhara Koichi ID: 9000401675717

    Articles in CiNii:1

    • 1998-12-30 (1998)
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