Search Results1-20 of  24

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  • MIMURA Yoshiaki ID: 9000001843119

    Mimura Dental Clinic (2001 from CiNii)

    Articles in CiNii:2

    • Occlusion and Erect Bipedal Walk : Part 1 Reconstruction of Occlusion and Erect Bipedal Walk (2001)
    • Occlusion and Erect Bipedal Walk : Part 2 Mandibular Position and Balance of the Foot Sole Pressure (2001)
  • MIMURA Yoshiaki ID: 9000004599658

    Institute of Clinical Materials (2011 from CiNii)

    Articles in CiNii:5

    • Bactericidal Action and Cytotoxicity of Electrolytic Acid Water in vitro (1997)
    • Analytical Study on the Epithelialization by Means of Tissue Culture (2005)
    • A Survey of Mouthguards for Rugby Players of Semi-Pro League Players (2011)
  • MIMURA Yoshiaki ID: 9000005561286

    NTT LSI Laboratories (1994 from CiNii)

    Articles in CiNii:1

    • A New Photochemical Selective Silylation Technique for Resist Materials (1994)
  • MIMURA Yoshiaki ID: 9000005562697

    NTT LSI Laboratories (1996 from CiNii)

    Articles in CiNii:1

    • A Silicon Oxide Antireflective Layer For Optical Lithography Using Electron Cyclotron Resonance Plasma Deposition (1996)
  • MIMURA Yoshiaki ID: 9000005755300

    NTT Electrical Communications Laboratories (1986 from CiNii)

    Articles in CiNii:1

    • Ultrasonic Treatment Applied to High Quality Lift-Off Technique : High Power Ultrasonics (1986)
  • MIMURA Yoshiaki ID: 9000253101641

    Ibaraki Branch, Electrical Communication Laboratory, Nippon Telegraph and Telephone Public Corporation (1963 from CiNii)

    Articles in CiNii:1

    • Separation of Thorium by using Fluoboric Acid as a Precipitant (1963)
  • MIMURA Yoshiaki ID: 9000253321220

    日本電信電話公社武藏野電気通信研究所 (1978 from CiNii)

    Articles in CiNii:1

    • Deep-UV Lithography (1978)
  • MIMURA Yoshiaki ID: 9000253323698

    NTT Electrical Communications Laboratories. (1986 from CiNii)

    Articles in CiNii:1

    • Junction Fabrication Technique by Double-Layer Resist Process (1986)
  • MIMURA Yoshiaki ID: 9000256369505

    Department of Pediatrics, Nara Medical College (1980 from CiNii)

    Articles in CiNii:1

    • Management of bleeding episodes with factor VIII concentrates in hemophiliacs with low titre inhibitor (1980)
  • Mimura Yoshiaki ID: 9000002882701

    日本電信電話公社武蔵野電気通信研究所 (1976 from CiNii)

    Articles in CiNii:1

    • FINE PATTERN FABRICATION USING FREON GAS PLASMA ETCHING (1976)
  • Mimura Yoshiaki ID: 9000252945109

    Articles in CiNii:1

    • Deep-UV Photolithography (1978)
  • Mimura Yoshiaki ID: 9000254268843

    正会員 日本電信電話公社武蔵野電気通信研究所 (1976 from CiNii)

    Articles in CiNii:1

    • FINE PATTERN FABRICATION USING FREON GAS PLASMA ETCHING (1976)
  • Mimura Yoshiaki ID: 9000258122087

    NTT LSI Laboratories, 3–1 Morinosato Wakamiya, Atsugi–shi, Kanagawa 243–01 (1994 from CiNii)

    Articles in CiNii:1

    • A New Photochemical Selective Silylation Technique for Resist Materials. (1994)
  • Mimura Yoshiaki ID: 9000258122238

    NTT LSI Laboratories, 3–1 Morinosato Wakamiya, Atsugi–shi, Kanagawa 243–01 (1994 from CiNii)

    Articles in CiNii:1

    • Patterning Characteristics of Oblique Illumination Optical Lithography. (1994)
  • Mimura Yoshiaki ID: 9000258126325

    NTT LSI Laboratories 3–1 Morinosato Wakamiya, Atsugi, Kanagawa 243–01, Japan (1995 from CiNii)

    Articles in CiNii:1

    • Resolution Enhancement by Oblique Illumination Optical Lithography Using a Transmittance-Adjusted Pupil Filter. (1995)
  • Mimura Yoshiaki ID: 9000284278785

    Articles in CiNii:1

    • New Silylation Bi-layer Resist System Employing Photochemical Selective Resist Silylation. (1994)
  • Mimura Yoshiaki ID: 9000398979546

    Articles in CiNii:1

    • D-1 Effect of Ultrasonic Treatments Applied for High Quality Lift-off Technique "SHULOT" (1985)
  • Mimura Yoshiaki ID: 9000401641372

    Articles in CiNii:1

    • Patterning Characteristics of Oblique Illumination Optical Lithography (1994)
  • Mimura Yoshiaki ID: 9000401641375

    Articles in CiNii:1

    • A New Photochemical Selective Silylation Technique for Resist Materials (1994)
  • Mimura Yoshiaki ID: 9000401642020

    Articles in CiNii:1

    • New Silylation Bi-layer Resist System Employing Photochemical Selective Resist Silylation (1994)
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