Search Results1-20 of  35

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  • MIYACHI KEIJI ID: 9000283814825

    ASAHI SUNAC CORPORATION (2008 from CiNii)

    Articles in CiNii:1

    • スプレイ式洗浄の粒子解析と洗浄力に関する考察:二流体スプレイと高圧マイクロジェットの洗浄力比較 (2008)
  • MIYACHI Keiji ID: 9000001479865

    Asahi Sunac Corporation, NC Division (2005 from CiNii)

    Articles in CiNii:1

    • Development and Analysis of a High-Pressure Micro Jet Pad Conditioning System for Interlayer Dielectric Chemical Mechanical Planarization (2005)
  • MIYACHI Keiji ID: 9000003137270

    Articles in CiNii:19

    • 超高圧マイクロジェットを用いたパッドドレッシングに関する研究 (2000)
    • Study of a CMP pad conditioning using high-pressure micro jet (HPMJ) : Characterization of slurry residues in pad grooves by UV-enhanced fluorescence (2006)
    • CMP pad cleaning and conditioning technology for the semiconductor manufacturing with super high-pressure micro jet (HPMJ) (2007)
  • MIYACHI Keiji ID: 9000019967536

    旭サナック(株)|九州大学大学院工学研究院 (2009 from CiNii)

    Articles in CiNii:1

    • An Analysis of Particles in Spray Cleaning and A Study on their Cleaning Efficiency:- A Comparison of Cleaning Efficiency between Two Fluid Spray and High Pressure Micro Jet Spray - (2009)
  • MIYACHI Keiji ID: 9000019973921

    旭サナック (株)|九州大学大学院工学研究院 (2010 from CiNii)

    Articles in CiNii:1

    • Research on Cleaning Efficiency of High Pressure Micro Jet:—Influence of different shape nozzles in cleaning efficiency— (2010)
  • MIYACHI Keiji ID: 9000022205841

    旭サナック (株)|九州大学大学院工学研究院 (2010 from CiNii)

    Articles in CiNii:1

    • Unwoven Fabric Pads Non-Destructive conditioning by High Pressure Micro Jet in CMP Process (2010)
  • MIYACHI Keiji ID: 9000107317228

    Asahi Sunac Corporation (2006 from CiNii)

    Articles in CiNii:1

    • Characterization of Slurry Residues in Pad Grooves for Diamond Disc and High Pressure Micro Jet Pad Conditioning Processes (2006)
  • MIYACHI Keiji ID: 9000240072053

    Articles in CiNii:1

    • A Study of the Conformal Coating Technique on the 3D Stack Semiconductors Devices:—1<sup>st</sup> report, Invention of the Through-Silicon Via (TSV) Coating Method with the Rotary Atomizer Aerosol Spray and Trail Manufacture of a Coating System— (2012)
  • MIYACHI Keiji ID: 9000258007988

    旭サナック(株) (2006 from CiNii)

    Articles in CiNii:1

    • Study of a CMP pad conditioning using high-pressure micro jet (HPMJ):Characterization of slurry residues in pad grooves by UV-enhanced fluorescence (2006)
  • MIYACHI Keiji ID: 9000305591985

    Sunac Corporation (2014 from CiNii)

    Articles in CiNii:1

    • 715 Resist coating for the manufacturing process of TSV by electrostatic spray (2014)
  • MIYACHI Keiji ID: 9000310317795

    Asahi Sunac Corporation (2011 from CiNii)

    Articles in CiNii:1

    • 3371 Study on Formation of Films by a Spray Deposition Method for the Organic Thin Film Solar Cells (2011)
  • MIYACHI Keiji ID: 9000331426316

    Asahi Sunac Corporation (2016 from CiNii)

    Articles in CiNii:1

    • A-01 A Study of the Resist Coating for the Manufacturing Process of TSV with the Electrospray : Refinement of Resist Pattern Coating by the Counter Electrode (2016)
  • MIYACHI Keiji ID: 9000386285956

    Asahi Sunac Corporation (2015 from CiNii)

    Articles in CiNii:1

    • 818 A Study of the Resist Coating with the Electrospray:-Making Efficient of the Resist Coating by Introducing the Multi-Nozzle- (2015)
  • MIYACHI Keiji ID: 9000386285965

    Asahi Sunac Corporation (2015 from CiNii)

    Articles in CiNii:1

    • 817 Research for resist pattern coating for the manufacturing process of TSV and MEMS by electrostatic spray (2015)
  • MIYACHI Keiji ID: 9000398258112

    Asahi Sunac Corporation (2018 from CiNii)

    Articles in CiNii:1

    • High efficient deposition using resist film thickness distribution for TSV (2018)
  • Miyachi Keiji ID: 9000025083345

    Articles in CiNii:1

    • Silicon wafer cleaning using new liquid aerosol with controlled droplet velocity and size by rotary atomizer method (2010)
  • Miyachi Keiji ID: 9000258179602

    Asahi Sunac Corporation, NC Division (2005 from CiNii)

    Articles in CiNii:1

    • Development and Analysis of a High-Pressure Micro Jet Pad Conditioning System for Interlayer Dielectric Chemical Mechanical Planarization (2005)
  • Miyachi Keiji ID: 9000258635339

    Asahi Sunac Corporation (2003 from CiNii)

    Articles in CiNii:1

    • A Development of Super High-Pressure Micro Jet System for Pad Dressing and POST-CMP Cleaning in CMP Process (2003)
  • Miyachi Keiji ID: 9000258637548

    Asahi Sunac Corporation (2004 from CiNii)

    Articles in CiNii:1

    • A Pad Conditioning Technique using High-pressure Micro Jet (2004)
  • Miyachi Keiji ID: 9000258639145

    Asahi Sunac Corporation (2004 from CiNii)

    Articles in CiNii:1

    • A Pad Conditioing Technique using Super High-pressure Micro Jet Cleaning (2004)
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