Search Results1-20 of  73

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  • MATSUDA Tadahito ID: 9000000027768

    NTTシステムエレクトロニクス研究所 (1997 from CiNii)

    Articles in CiNii:2

    • 1997International Workshop on X-ray and Extreme Ultraviolet Lithography (XEL'97) (研究会報告) (1997)
    • Sub-Quarter Micron LSI Fabrication using X-ray Lithography (1996)
  • MATSUDA Tadahito ID: 9000003772292

    日本電信電話公社(現NTT) システムエレクトロニクス研究所 (1997 from CiNii)

    Articles in CiNii:2

    • 微細化に挑戦するリソグラフィ技術 (1997)
    • Development of Semiconductor Production Technolgy to Realize Higher Integration : Microfabrication Technology Supporting Next Generation LSIs (1997)
  • MATSUDA Tadahito ID: 9000004870873

    NTT Telecommunications Energy Laboratories (2000 from CiNii)

    Articles in CiNii:13

    • Real-Time Feed-Forward Control LSIs for a Direct Wafer Exposure Electron Beam System (1993)
    • Patterning Characteristics of Hole Patterns in Synchrotron Radiation Lithography (1998)
    • Ta/SiN-Stucture X-Ray Masks for Sub-Half-Micron LSIs : Lithography Technology : (1989)
  • MATSUDA Tadahito ID: 9000004966789

    NTT LSI Laboratories (1995 from CiNii)

    Articles in CiNii:3

    • A New Spatial Frequency Doubling Method (FREDIS) for Sub-0.15-μm Optaical Lithography (1995)
    • Application of a p^+ poly Si gate with thin nitrogen doped layer to sob-1/4 μm dual gate CMOS (1993)
    • Hole pattern fabrication using halftone phase-shifting masks (1993)
  • Matsuda Tadahito ID: 9000004871270

    NTT LSI Laboratories (1993 from CiNii)

    Articles in CiNii:1

    • Effects of Synchrotron X-Ray Irradiation on Hot Carrier Reliability in Subquarter-Micrometer NMOSFETs (Special Issue on Sub-Half Micron Si Device and Process Technologies) (1993)
  • Matsuda Tadahito ID: 9000005001137

    NTT (1995 from CiNii)

    Articles in CiNii:1

    • Sub-quartermicron device fabrication using SR lithoraphy (1995)
  • Matsuda Tadahito ID: 9000005313107

    NTT Electrical Communications Laboratories (1987 from CiNii)

    Articles in CiNii:1

    • Submicron Electron-Beam Direct Writing Technology (1987)
  • Matsuda Tadahito ID: 9000252766076

    NTT LSI Laboratories (1992 from CiNii)

    Articles in CiNii:1

    • Sub-100-nm-Scale Patterning Using a Low-Energy Electron Beam (1992)
  • Matsuda Tadahito ID: 9000252968122

    NTT LSI Laboratories (1989 from CiNii)

    Articles in CiNii:1

    • Ta/SiN-Structure X-Ray Masks for Sub-Half-Micron LSIs (1989)
  • Matsuda Tadahito ID: 9000252972045

    NTT LSI Laboratories (1990 from CiNii)

    Articles in CiNii:1

    • Very-Low-Energy Electron Beam Lithography Using a Retarding Field (1990)
  • Matsuda Tadahito ID: 9000252979682

    NIT LSI Laboratories (1991 from CiNii)

    Articles in CiNii:1

    • Contrast Enhancement of SAL Resist by Reducing Residual Solvent at Prebake (1991)
  • Matsuda Tadahito ID: 9000252980909

    NTT LSI Laboratories (1992 from CiNii)

    Articles in CiNii:1

    • Characteristics of a Monodisperse PHS-Based Positive Resist (MDPR) in KrF Excimer Laser Lithography (1992)
  • Matsuda Tadahito ID: 9000252981047

    NTT LSI Laboratories (1992 from CiNii)

    Articles in CiNii:1

    • X-Ray Phase-Shifting Mask for 0.1-μm Pattern Replication under a Large Proximity Gap Condition (1992)
  • Matsuda Tadahito ID: 9000252982169

    NTT LSI Laboratories (1992 from CiNii)

    Articles in CiNii:1

    • Patterning Characteristics of a Chemically-Amplified Negative Resist in Synchrotron Radiation Lithography (1992)
  • Matsuda Tadahito ID: 9000252984997

    NTT LSI Laboratories (1993 from CiNii)

    Articles in CiNii:1

    • Resolution Enhancement of Hole Patterns in Sychrotron Radiation Lithography (1993)
  • Matsuda Tadahito ID: 9000252985092

    NTT LSI Laboratories (1993 from CiNii)

    Articles in CiNii:1

    • X-Ray Mask Pattern Accuracy Improvement by Superimposing Multiple Exposures Using Different Field Sizes (1993)
  • Matsuda Tadahito ID: 9000252985205

    NTT LSI Laboratories (1993 from CiNii)

    Articles in CiNii:1

    • Hole Pattern Fabrication using Halftone Phase-Shifting Masks in KrF Lithography (1993)
  • Matsuda Tadahito ID: 9000252985303

    NTT LSI Laboratories (1993 from CiNii)

    Articles in CiNii:1

    • A New Proximity Parameter Evaluation Method Utilizing Auxiliary Patterns for Dose Compensation (1993)
  • Matsuda Tadahito ID: 9000253031088

    NTT LSI Laboratories (1991 from CiNii)

    Articles in CiNii:1

    • Patterning characteristics of a partially achromatized projection lens for ArF excimer laser. (1991)
  • Matsuda Tadahito ID: 9000253031127

    NTT LSI Laboratories (1992 from CiNii)

    Articles in CiNii:1

    • A New Fabrication Technique for Fine Circular Patterns. (1992)
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