Search Results121-140 of  142

  • Matsuda Yoshinobu ID: 9000402027270

    Articles in CiNii:1

    • Infrared spectroscopic study of the reactions between an octadecyltrichlorosilane self-assembled monolayer and plasma (2014)
  • Matsuda Yoshinobu ID: 9000402411144

    Articles in CiNii:1

    • Simulation of voltage/current waveforms and contact area of pulsed surface discharge on water (2019)
  • Matsuda Yoshinobu ID: 9000402760233

    Articles in CiNii:1

    • Reduction and uniformization of the resistivity of Ga-doped ZnO by combining short-gap magnetron sputtering and buffer layer (2019)
  • Matsuda Yoshinobu ID: 9000403654054

    Articles in CiNii:1

    • Generation of Solution Plasma for Surface Treatment (2008)
  • Matsuda Yoshinobu ID: 9000403654079

    Articles in CiNii:1

    • Investigation of Deposition Process of Amorphous Carbon Film (2008)
  • Matsuda Yoshinobu ID: 9000403654352

    Articles in CiNii:1

    • Observation of Arcing in DC Magnetron Sputtering of AZO Target (2009)
  • Matsuda Yoshinobu ID: 9000403654357

    Articles in CiNii:1

    • Absorption Measurement of Zn Atom Density during ICP-assisted Magnetron Sputter-deposition of Al-doped ZnO Thin Films (2009)
  • Matsuda Yoshinobu ID: 9000403654392

    Articles in CiNii:1

    • Influence of hydrogen addition on electric and optical properties of sputter-deposited aluminum-doped zinc oxide thin films (2009)
  • Matsuda Yoshinobu ID: 9000403654395

    Articles in CiNii:1

    • Monitoring of Chemical Vapor Deposition Process of Hydrocarbon Thin Films by Optical Reflectance Interferometry (2009)
  • Matsuda Yoshinobu ID: 9000403654406

    Articles in CiNii:1

    • Source Molecular Effect on Amorphous Carbon Film Deposition (2009)
  • Matsuda Yoshinobu ID: 9000403654413

    Articles in CiNii:1

    • Substrate Bias Effect on Deposition Process of Amorphous Carbon Films (2009)
  • Matsuda Yoshinobu ID: 9000403654658

    Articles in CiNii:1

    • Plasma Generation in Organic Solvent for Amorphous Carbon Film Deposition inside a Narrow Tube (2010)
  • Matsuda Yoshinobu ID: 9000403654664

    Articles in CiNii:1

    • Effects of Hydrogen Plasma Exposure on Amorphous Carbon Film Surface, Investigated with Infrared Spectroscopy (2010)
  • Matsuda Yoshinobu ID: 9000403654670

    Articles in CiNii:1

    • Oxidation Process of Amorphous Carbon Film Due to Oxygen Plasma, Investigated with Infrared Spectroscopy (2010)
  • Matsuda Yoshinobu ID: 9000403654690

    Articles in CiNii:1

    • Measurement of Metal Atom Densities during Sputter-deposition of Al-doped ZnO Thin Films (2010)
  • Matsuda Yoshinobu ID: 9000403654694

    Articles in CiNii:1

    • Thermal Probe Measurements of Energy Flux onto a Substrate in Inductively Coupled Plasmas (2010)
  • Matsuda Yoshinobu ID: 9000403654963

    Articles in CiNii:1

    • Deposition of transparent conducting Al-doped ZnO thin films by ICP-assisted sputtering (2010)
  • Matsuda Yoshinobu ID: 9000403654968

    Articles in CiNii:1

    • Thermal probe measurements of energy flux onto a substrate during ICP assisted sputter-deposition (2010)
  • Matsuda Yoshinobu ID: 9000404343683

    Department of Orthopaedic Surgery, Sano Memorial Hospital (2019 from CiNii)

    Articles in CiNii:1

    • 20190918 (2019)
  • Matsuda Yoshinobu ID: 9000404343856

    Department of Orthopaedic Surgery, Osaka City University Graduate School of Medicine (2019 from CiNii)

    Articles in CiNii:1

    • 20190918 (2019)
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