Search Results1-20 of  20

  • MIYAGAWA Kazuhiro ID: 9000001028132

    日清紡(株) (1997 from CiNii)

    Articles in CiNii:1

    • Deformation of Vertical Rolling Guideway (1997)
  • MIYAGAWA Kazuhiro ID: 9000001496594

    Semiconductor Leading Edge Technologies Inc. (2004 from CiNii)

    Articles in CiNii:1

    • Effect of Fluorine on Interface Characteristics in Low-temperature CMIS Process with HfO_2 Metal Gate Stacks (2004)
  • MIYAGAWA Kazuhiro ID: 9000003834430

    Yamanashi Industial Technology Center (2002 from CiNii)

    Articles in CiNii:1

    • The Development of the UV Curing Resin and Systematization of the Resin Model Burned Process (2002)
  • MIYAGAWA Kazuhiro ID: 9000286623705

    Yamanashi Prefectual Industrial Technology Center (2014 from CiNii)

    Articles in CiNii:1

    • Electropolishing Behavior of Au-Ag-Cu Alloy in Electropolishing Solutions Containing Thiourea (2014)
  • MIYAGAWA Kazuhiro ID: 9000331096652

    山梨県工業技術センター (2016 from CiNii)

    Articles in CiNii:3

    • Development of Non-cyanide Electropolishing Solution for Low-Grade Gold Alloy and Elucidation of Polish Behavior (2012)
    • Research on Development of Precious Metal Alloys for Jewelry (2013)
    • 水晶とめのう(ご当地の化学[山梨県/関東支部]) (2016)
  • MIYAGAWA Kazuhiro ID: 9000402617669

    Yamanashi Industrial Technology Center (2018 from CiNii)

    Articles in CiNii:1

    • Polishing for Hard Materials using Magnetic Barrel Machining (2018)
  • Miyagawa Kazuhiro ID: 9000019305679

    Articles in CiNii:1

    • Y-Line Emission and Lattice Relaxation in MBE-ZnSe and -ZnSSe on GaAs (1989)
  • Miyagawa Kazuhiro ID: 9000019310155

    Articles in CiNii:1

    • Nitrogen-Doped ZnSe and ZnSSe Grown by Molecular Beam Epitaxy (1990)
  • Miyagawa Kazuhiro ID: 9000019392014

    Articles in CiNii:1

    • Effect of Fluorine on Interface Characteristics in Low-Temperature CMIS Process with HfO2 Metal Gate Stacks (2005)
  • Miyagawa Kazuhiro ID: 9000019564837

    Articles in CiNii:1

    • Molecular Beam Epitaxial Growth of ZnSSe with Hg–Xe Lamp Irradiation (1990)
  • Miyagawa Kazuhiro ID: 9000022071608

    Graduate School of Economics, Hitotsubashi University (2010 from CiNii)

    Articles in CiNii:1

    • An Investment Behavior Analysis using by Brain Computer Interface (2010)
  • Miyagawa Kazuhiro ID: 9000252762904

    Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institute of Technology (1990 from CiNii)

    Articles in CiNii:1

    • Nitrogen-Doped ZnSe and ZnSSe Grown by Molecular Beam Epitaxy (1990)
  • Miyagawa Kazuhiro ID: 9000252969498

    Department of Electrical Engineering, Technical College, Kyoto Institute of Technology (1989 from CiNii)

    Articles in CiNii:1

    • Y-Line Emission and Lattice Relaxation in MBE-ZnSe and -ZnSSe on GaAs (1989)
  • Miyagawa Kazuhiro ID: 9000252974650

    Department of Electronics and Information Science, Faculty of Engineering and Design, Kyoto Institute of Technology (1990 from CiNii)

    Articles in CiNii:1

    • Molecular Beam Epitaxial Growth of ZnSSe with Hg–Xe Lamp Irradiation (1990)
  • Miyagawa Kazuhiro ID: 9000258180634

    Semiconductor Leading Edge Technologies Inc. (2005 from CiNii)

    Articles in CiNii:1

    • Effect of Fluorine on Interface Characteristics in Low-Temperature CMIS Process with HfO2 Metal Gate Stacks (2005)
  • Miyagawa Kazuhiro ID: 9000391822032

    Yamanashi Industrial Technology Center (2011 from CiNii)

    Articles in CiNii:1

    • Research on Coloring of Agate (2011)
  • Miyagawa Kazuhiro ID: 9000401613346

    Articles in CiNii:1

    • Y-Line Emission and Lattice Relaxation in MBE-ZnSe and -ZnSSe on GaAs (1989)
  • Miyagawa Kazuhiro ID: 9000401619841

    Articles in CiNii:1

    • Nitrogen-Doped ZnSe and ZnSSe Grown by Molecular Beam Epitaxy (1990)
  • Miyagawa Kazuhiro ID: 9000401620840

    Articles in CiNii:1

    • Molecular Beam Epitaxial Growth of ZnSSe with Hg-Xe Lamp Irradiation (1990)
  • Miyagawa Kazuhiro ID: 9000401735670

    Articles in CiNii:1

    • Effect of Fluorine on Interface Characteristics in Low-Temperature CMIS Process with HfO2Metal Gate Stacks (2005)
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