Search Results1-20 of  34

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  • MORIKAWA Yasuhiro ID: 9000000108322

    Dept. of Electrical and Electronic Engineering, Toyo Univ. (1996 from CiNii)

    Articles in CiNii:1

    • Preparation of oxidefilms by laser ablation (1996)
  • MORIKAWA Yasuhiro ID: 9000000407624

    東北大学大学院工学研究科地球工学専攻 (2001 from CiNii)

    Articles in CiNii:3

    • ローダとタンプトラックの協調作業による鉱石積み込みて乍業の自動化に関する基礎的研究-ダンプトラックガローダに接近する場合- (2000)
    • FUNDAMETAL STUDY ON THE AUTOMATIC LOADING OF SOILS BY COOPERATIVE TASK BETWEEN WHEEL LOADER AND DUMP TRUCK (2001)
    • オーバヘッド型ベッセル搭載LHDの機構に関する研究 (2001)
  • MORIKAWA Yasuhiro ID: 9000000615801

    Institute of Semiconductors and Electronics Technologies, ULVAC Inc. (2010 from CiNii)

    Articles in CiNii:2

    • 低圧, 高密度NLDプラズマと有機Low-kエッチングプロセス (2000)
    • Etching Technologies in NLD (magnetic Neutral Loop Discharge) Plasma (2010)
  • MORIKAWA Yasuhiro ID: 9000014621944

    National Institute of Information and Communications Technology (2009 from CiNii)

    Articles in CiNii:1

    • OneSpaceNet : A cloud computing environment for space sciences : A virtual laboratory via high-speed network (2009)
  • MORIKAWA Yasuhiro ID: 9000015606205

    Department of Electrical Engineering, Toyo University (2003 from CiNii)

    Articles in CiNii:1

    • Etching Reactivity of Negative Ions Generated in Cl_2 Downstream Plasma (2003)
  • MORIKAWA Yasuhiro ID: 9000020065017

    Articles in CiNii:1

    • Fatigue Properties and Fatigue Crack Behavior of Steel with TiNx Films Laminated by Dynamic Mixing Method. (1994)
  • MORIKAWA Yasuhiro ID: 9000022070305

    National Institute of Information and Communications Technology (NICT), Tokyo 184-8795, Japan (2011 from CiNii)

    Articles in CiNii:1

    • Three-Dimensional Modeling of the Solar Active Region (2011)
  • MORIKAWA Yasuhiro ID: 9000107348938

    Institute for Semiconductor Technologies, ULVAC, Inc. (2003 from CiNii)

    Articles in CiNii:1

    • Etching Characteristics of Organic Polymers in the Magnetic Neutral Loop Discharge Plasma (2003)
  • MORIKAWA Yasuhiro ID: 9000107349366

    Institute for Semiconductor Technologies, ULVAC, Inc. (2003 from CiNii)

    Articles in CiNii:1

    • Investigations of Surface Reactions in Neutral Loop Discharge Plasma for High-Aspect-Ratio SiO_2 Etching (2003)
  • MORIKAWA Yasuhiro ID: 9000254805699

    JAPAN SOCIETY OF CIVIL ENGINEERS (2001 from CiNii)

    Articles in CiNii:1

    • Fundamental study on the automatic loading of soils by cooperative task between wheel loader and dump truck. (2001)
  • MORIKAWA Yasuhiro ID: 9000262367754

    Graduate School of Medicine, Osaka City University (2013 from CiNii)

    Articles in CiNii:1

    • Fluorescence imaging of ICG area inside of the body assisted by ultrasonic (2013)
  • MORIKAWA Yasuhiro ID: 9000363490406

    情報通信研究機構 (2011 from CiNii)

    Articles in CiNii:18

    • Document generation for numerical models by RDoc (2007)
    • P388 ソフトウェアとしての可読性を重視した全球プリミティブモデル (2005)
    • RDocを用いた数値モデルのドキュメント生成 (2006)
  • Morikawa Yasuhiro ID: 9000003175312

    三菱重工業株式會社横濱船渠 (1942 from CiNii)

    Articles in CiNii:1

    • EFFECT OF SULPHUR ON CAST IRON (1942)
  • Morikawa Yasuhiro ID: 9000005307666

    三菱電機 (1996 from CiNii)

    Articles in CiNii:2

    • High picture technology of S-VHS VCR HV-V900L (1995)
    • 6)S-VHS VTR HV-V900Lの高画質化技術(コンシューマエレクトロニクス研究会) (1996)
  • Morikawa Yasuhiro ID: 9000253696408

    Dept. of Electrical and Electronic Engineering, Toyo Univ. (1996 from CiNii)

    Articles in CiNii:1

    • D. レーザープ・セシング (1996)
  • Morikawa Yasuhiro ID: 9000258159944

    Institute for Semiconductor Technologies, ULVAC, Inc., 1220-1 Suyama, Susono, Shizuoka 410-1231, Japan (2002 from CiNii)

    Articles in CiNii:1

    • Control of Surface Reaction on Highly Accurate Low-k Methylsilsesquioxane Etching Process (2002)
  • Morikawa Yasuhiro ID: 9000258165717

    Department of Electrical Engineering, Toyo University (2003 from CiNii)

    Articles in CiNii:1

    • Etching Reactivity of Negative Ions Generated in Cl2 Downstream Plasma. (2003)
  • Morikawa Yasuhiro ID: 9000258165801

    Institute for Semiconductor Technologies, ULVAC, Inc. (2003 from CiNii)

    Articles in CiNii:1

    • Etching Characteristics of Organic Polymers in the Magnetic Neutral Loop Discharge Plasma. (2003)
  • Morikawa Yasuhiro ID: 9000258165836

    Institute for Semiconductor Technologies, ULVAC, Inc. (2003 from CiNii)

    Articles in CiNii:1

    • Investigations of Surface Reactions in Neutral Loop Discharge Plasma for High-Aspect-Ratio SiO2 Etching. (2003)
  • Morikawa Yasuhiro ID: 9000258560170

    Graduate School of Science, Hokkaido University (2006 from CiNii)

    Articles in CiNii:1

    • Development of a general circulation model for planetary atmospheres: the GFD Dennou Club DCPAM (2006)
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