Search Results1-11 of  11

  • NAKAHIGASHI Takahiro ID: 9000002961829

    Articles in CiNii:11

    • Application of DLC Coating to Rubber and Polymer Materials (2002)
    • Developments of Flexible DLC for Polymer Materials (2002)
    • Usage of Extending Carbon Films Including DLC (2004)
  • NAKAHIGASHI Takahiro ID: 9000005563418

    R D Division, Nissin Electric Co., Ltd. (1997 from CiNii)

    Articles in CiNii:2

    • Properties of a-Si:H Film Deposited by Amplitude-Modulated RF Plasma Chemical Vapour Deposition for Thin Film Transistor (1997)
    • Study of Deposition Process in Modulated RF Silane Plasma (<Special Issue> Plasma Processing) (1994)
  • NAKAHIGASHI Takahiro ID: 9000020108282

    Nissin Electric Co. (1988 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1988)
  • NAKAHIGASHI Takahiro ID: 9000020159106

    Nissin Electric Co. (1987 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1987)
  • NAKAHIGASHI Takahiro ID: 9000020323284

    Nissin Electric Co., Ltd (1988 from CiNii)

    Articles in CiNii:1

    • Properties of the B-Si-N ceramic thin films by plasma-CVD. (1988)
  • Nakahigashi Takahiro ID: 9000005878364

    NIPPON ITF INC (2004 from CiNii)

    Articles in CiNii:1

    • Effect of wettability on lubricity of DLC films (2004)
  • Nakahigashi Takahiro ID: 9000021263085

    Nippon ITF Inc. (2008 from CiNii)

    Articles in CiNii:1

    • The Effect of Sandblasting of UHMWPE Substrate on the Wear Resistance of Hydrogen-Containing Carbon Coating (2008)
  • Nakahigashi Takahiro ID: 9000258123621

    Department of Display Devices, R & D Division, Nissin Electric Co., Ltd., 47 Umezu–Takase–cho, Ukyo–ku, Kyoto 615 (1994 from CiNii)

    Articles in CiNii:1

    • Study of Deposition Process in Modulated RF Silane Plasma. (1994)
  • Nakahigashi Takahiro ID: 9000258134987

    R & D Division, Nissin Electric Co., Ltd., 47 Umezu–Takase–cho, Ukyo–ku, Kyoto 615, Japan (1997 from CiNii)

    Articles in CiNii:1

    • Properties of a-Si:H Film Deposited by Amplitude-Modulated RF Plasma Chemical Vapour Deposition for Thin Film Transistor. (1997)
  • Nakahigashi Takahiro ID: 9000401642659

    Articles in CiNii:1

    • Study of Deposition Process in Modulated RF Silane Plasma (1994)
  • Nakahigashi Takahiro ID: 9000401664211

    Articles in CiNii:1

    • Properties of a-Si:H Film Deposited by Amplitude-Modulated RF Plasma Chemical Vapour Deposition for Thin Film Transistor (1997)
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