Search Results1-20 of  21

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  • NAMURA Takashi ID: 9000000968323

    Department of Medical Information, Osakakouseinenkin Hp. (2000 from CiNii)

    Articles in CiNii:1

    • Installation and Experience of the Automatic Scheduling System for Multiple Diagnostic Examinations (2000)
  • NAMURA Takashi ID: 9000004812900

    Kyoto Research Laboratory, Matsushita Electronics Corporation (1996 from CiNii)

    Articles in CiNii:4

    • Quantitative Charge Build-Up Evaluation Technique by Using MOS Capacitors with Charge Collecting Electrodes in Wafer Processing (1996)
    • Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher : Etching and Deposition Technology : (1991)
    • Evaluation of Device Charging in Ion Implantation : Ion Beam Process : (1992)
  • NAMURA Takashi ID: 9000005560612

    Kyoto Research Laboratory, Matsushita Electronics Corporation (1994 from CiNii)

    Articles in CiNii:1

    • Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field (1994)
  • Namura Takashi ID: 9000004967196

    Matsushita Electronics Corp. (1993 from CiNii)

    Articles in CiNii:1

    • Evaluation of charge build-up in wafer processing by using MOS capacitors with charge collecting electrodes (1993)
  • Namura Takashi ID: 9000252758734

    Department of Electronics, Kyoto University (1985 from CiNii)

    Articles in CiNii:1

    • A Probe for Measurements of Negative and Positive Ions in a Plasma (1985)
  • Namura Takashi ID: 9000252760543

    Kyoto Research Laboratory, Matsushita Electronics Corporation (1988 from CiNii)

    Articles in CiNii:1

    • Epitaxial Lateral Overgrowth (ELO) of Silicon on the Whole Surface (1988)
  • Namura Takashi ID: 9000252762206

    Kyoto Research Lab., Matsushita Electronics Corp. (1990 from CiNii)

    Articles in CiNii:1

    • Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher (1990)
  • Namura Takashi ID: 9000252976287

    Kyoto Research Lab., Matsushita Electronics Corp. (1991 from CiNii)

    Articles in CiNii:1

    • Evaluation of Device Charging in Ion Implantation (1991)
  • Namura Takashi ID: 9000252977384

    Kyoto Research Laboratory, Matsushita Electronics Corp. (1991 from CiNii)

    Articles in CiNii:1

    • Charge Buildup in Magnetized Process Plasma (1991)
  • Namura Takashi ID: 9000258121698

    Kyoto Research Laboratory, Matsushita Electronics Corporation, 19 Nishikujo–Kasugacho, Minami–ku, Kyoto 601 (1994 from CiNii)

    Articles in CiNii:1

    • Charge Build-Up and Uniformity Control in Magnetically Enhanced Reactive Ion Etching Using a Curved Lateral Magnetic Field. (1994)
  • Namura Takashi ID: 9000392695790

    Articles in CiNii:1

    • A Probe for Measurements of Negative and Positive Ions in a Plasma (1985)
  • Namura Takashi ID: 9000392712994

    Articles in CiNii:1

    • Epitaxial Lateral Overgrowth (ELO) of Silicon on the Whole Surface (1988)
  • Namura Takashi ID: 9000392716070

    Articles in CiNii:1

    • Evaluation of Device Charging in Ion Implantation (1991)
  • Namura Takashi ID: 9000392726756

    Articles in CiNii:1

    • Charge Buildup in Magnetized Process Plasma (1991)
  • Namura Takashi ID: 9000392732603

    Articles in CiNii:1

    • Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher (1990)
  • Namura Takashi ID: 9000401597397

    Articles in CiNii:1

    • A Probe for Measurements of Negative and Positive Ions in a Plasma (1985)
  • Namura Takashi ID: 9000401606706

    Articles in CiNii:1

    • Epitaxial Lateral Overgrowth (ELO) of Silicon on the Whole Surface (1988)
  • Namura Takashi ID: 9000401617124

    Articles in CiNii:1

    • Experimental and Theoretical Study of the Charge Build-Up in an ECR Etcher (1990)
  • Namura Takashi ID: 9000401622083

    Articles in CiNii:1

    • Charge Buildup in Magnetized Process Plasma (1991)
  • Namura Takashi ID: 9000401623539

    Articles in CiNii:1

    • Evaluation of Device Charging in Ion Implantation (1991)
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