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  • NISHIKAWA Musashi ID: 9000006124469

    Department of Applied Physics, Fukuoka University (2006 from CiNii)

    Articles in CiNii:3

    • Capacitance-Voltage Hysteresis of Polycrystalline Bi_<4-x>La_xTi_3O_<12> Thin Films formed on Si Substrates and Analysis of Interface States (2006)
    • Capacitance-Voltage Hysteresis of Polycrystalline Bi_<4-x>La_xTi_3O_<12> Thin Films formed on Si Substrates and Analysis of Interface States (2006)
    • Capacitance-Voltage Hysteresis of Polycrystalline Bi_<4-x>La_xTi_3O_<12> Thin Films formed on Si Substrates and Analysis of Interface States (2006)
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