Search Results1-11 of  11

  • NISHIZAKA Takeshi ID: 9000005551469

    Toshiba Research and Development Center, Toshiba Corporation (1995 from CiNii)

    Articles in CiNii:2

    • A Mask-to-Wafer Fine Gap Setting Method (1995)
    • A chromatic Aberration-Free Heterodyne Alignment for Optical Lithography : Lithography Technology : (1991)
  • NISHIZAKA Takeshi ID: 9000020743109

    Articles in CiNii:1

    • The Estimation and Improvement of TTL Alignment Error Budgets for an Excimer Laser Aligner. (1993)
  • NISHIZAKA Takeshi ID: 9000022197894

    Articles in CiNii:1

    • TTL Alignment for Excimer Laser Aligner. Real-Time SMART with Correcting Lateral Chromatic Aberration.:Real-Time SMART with Correcting Lateral Chromatic Aberration (1993)
  • NISHIZAKA Takeshi ID: 9000022200133

    Articles in CiNii:1

    • A Mask-to-wafer Fine Gap Setting Method. (1993)
  • NISHIZAKA Takeshi ID: 9000022201413

    Articles in CiNii:1

    • A New TTL Alignment Method for Optical Lithography System. Chromatic Aberration-Free TTL Alignment Technique Using Two Incident Beams.:Chromatic Aberration-Free TTL Alignment Technique Using Two Incident Beams (1992)
  • Nishizaka Takeshi ID: 9000252972274

    Research and Development Center, Toshiba Corp. (1990 from CiNii)

    Articles in CiNii:1

    • A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography (1990)
  • Nishizaka Takeshi ID: 9000252981073

    Research and Development Center, Toshiba Corporation (1992 from CiNii)

    Articles in CiNii:1

    • 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System (1992)
  • Nishizaka Takeshi ID: 9000392714847

    Articles in CiNii:1

    • A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography (1990)
  • Nishizaka Takeshi ID: 9000392720252

    Articles in CiNii:1

    • 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System (1992)
  • Nishizaka Takeshi ID: 9000401617417

    Articles in CiNii:1

    • A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography (1990)
  • Nishizaka Takeshi ID: 9000401629913

    Articles in CiNii:1

    • 1992-12-30 (1992)
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