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  • NATSUKA Yasutaka ID: 9000001649443

    Tsukuba Laboratory, Tokuyama Corporation (2005 from CiNii)

    Articles in CiNii:1

    • 10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching (2005)
  • Natsuka Yasutaka ID: 9000002974238

    Institute of Materials Science, University of Tsukuba (2001 from CiNii)

    Articles in CiNii:1

    • Polymerization of Acetylene in Novel Chiral Nemtic Liqid Crystalline Reaction Field (2001)
  • Natsuka Yasutaka ID: 9000258183900

    Tsukuba Laboratory, Tokuyama Corporation (2005 from CiNii)

    Articles in CiNii:1

    • 10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching (2005)
  • Natsuka Yasutaka ID: 9000401739346

    Articles in CiNii:1

    • 10-nm-Scale Pattern Delineation Using Calixarene Electron Beam Resist for Complementary Metal Oxide Semiconductor Gate Etching (2005)
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