Search Results1-14 of  14

  • Nishizaki Shogo ID: 9000024987858

    Articles in CiNii:1

    • High-quality polycrystalline silicon films with minority carrier lifetimes over 5μs formed by flash lamp annealing of precursor amorphous silicon films prepared by catalytic chemical vapor deposition (2007)
  • NISHIZAKI Shogo ID: 9000018468545

    School of Materials Science, Japan Advanced Institute of Science and Technology (JAIST) (2010 from CiNii)

    Articles in CiNii:1

    • Effects of High Nitrogen Pressure and Thermal Treatment on Adhesion to Amorphous Silicon/Silicon Nitride/Polyethersulfone Substrate during Excimer Laser Annealing (2010)
  • Nishizaki Shogo ID: 9000022759993

    Articles in CiNii:1

    • Thin-film polycrystalline silicon solar cells formed by flash lamp annealing of a-Si films (2010)
  • Nishizaki Shogo ID: 9000023261483

    Articles in CiNii:1

    • Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing (2008)
  • Nishizaki Shogo ID: 9000023266310

    Articles in CiNii:1

    • Poly-Si films with long carrier lifetime prepared by rapid thermal annealing of Cat-CVD amorphous silicon thin films (2008)
  • Nishizaki Shogo ID: 9000023267174

    Articles in CiNii:1

    • Precursor Cat-CVD a-Si films for the formation of high-quality poly-Si films on glass substrates by flash lamp annealing (2009)
  • Nishizaki Shogo ID: 9000023268424

    Articles in CiNii:1

    • Formation of Highly Uniform Micrometer-Order-Thick Polycrystalline Silicon Films by Flash Lamp Annealing of Amorphous Silicon on Glass Substrate (2007)
  • Nishizaki Shogo ID: 9000023334655

    Articles in CiNii:1

    • Advantage of plasma-less deposition: Cat-CVD fabrication of a-Si TFT with current drivability equivalent to poly-Si TFT (2010)
  • Nishizaki Shogo ID: 9000024592532

    Articles in CiNii:1

    • Advantage of Plasma-Less Deposition in Cat-CVD to the Performance of Electronic Devices (2011)
  • Nishizaki Shogo ID: 9000024710357

    Articles in CiNii:1

    • Explosive crystallization of amorphous silicon films by flash lamp annealing (2009)
  • Nishizaki Shogo ID: 9000025126934

    Articles in CiNii:1

    • Study on stability of amorphous silicon thin-film transistors prepared by catalytic chemical vapor deposition (2008)
  • Nishizaki Shogo ID: 9000401763499

    Articles in CiNii:1

    • 2007-11-06 (2007)
  • Nishizaki Shogo ID: 9000401775373

    Articles in CiNii:1

    • Formation of Several-Micrometer-Thick Polycrystalline Silicon Films on Soda Lime Glass by Flash Lamp Annealing (2008)
  • Nishizaki Shogo ID: 9000403666236

    Articles in CiNii:1

    • Thin film p-i-n poly-Si solar cells directly converted from p-i-n a-Si structures by a single shot of flash lamp (2008)
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