Search Results1-20 of  78

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  • OGAWA Soichi ID: 9000001228846

    Articles in CiNii:3

    • Preparations of ITO Thin Films by Low Temperature and Low Damage Process (2004)
    • Approach to High Deposition Rate with Gradient Facing Targets System (V cathodes) (2004)
    • 気相薄膜形成技術--応用編(第1回)低温プロセスによるITO薄膜形成技術 (2005)
  • OGAWA Soichi ID: 9000003242630

    Department of Physics, Faculty of Science, Osaka-City University (1966 from CiNii)

    Articles in CiNii:1

    • Magnetic Properties of Superconducting Sn Films (1966)
  • OGAWA Soichi ID: 9000015630408

    Osaka Industrial Promotion Organization (2003 from CiNii)

    Articles in CiNii:4

    • 気相薄膜形成技術--基礎編(3)スパッタリング法 (2002)
    • 気相薄膜形成技術 基礎編(第4回)イオンプレーティング法 (2002)
    • 気相薄膜形成技術--基礎編(第5回)化学気相成長法(CVD法) (2002)
  • OGAWA Soichi ID: 9000017439128

    Ogawa Creation Research Laboratory (2011 from CiNii)

    Articles in CiNii:2

    • Experimental Fabrication of High Efficiency Force Sensor by Cr-Si-C Composite Thin Film (2010)
    • Experimental Fabrication of Tension Measurement System for Roll-to-roll Sputtering Systems Using Highly Efficient Micro-sized Force Sensor (2011)
  • OGAWA Soichi ID: 9000017677906

    Sanyo Vacuum Industries Co., Ltd. (2010 from CiNii)

    Articles in CiNii:1

    • Low Temperature Deposition of Gas Barrier Films of Plastic Substrates and Evaluation of Gas Barrier (2010)
  • OGAWA Soichi ID: 9000019954937

    Osaka Prefectural Industrial Research Institute (1985 from CiNii)

    Articles in CiNii:1

    • The preparation of a-Si: H films by DIBS deposition method with lower energy side ions. (1985)
  • OGAWA Soichi ID: 9000019956342

    Osaka Prefectural Industrial Research Institute (1985 from CiNii)

    Articles in CiNii:1

    • Study of pressure measurement by ultrasonic sensor. (1985)
  • OGAWA Soichi ID: 9000020055751

    Osaka Prefectural Industrial Research Institute (1974 from CiNii)

    Articles in CiNii:1

    • Temperature Measurement of Evaporation Source with Photo-Transistor (1974)
  • OGAWA Soichi ID: 9000020058895

    Osaka Prefectural Industrial Technology Research Institute (1989 from CiNii)

    Articles in CiNii:1

    • Fabrication of BSCCO thin films. (1). (1989)
  • OGAWA Soichi ID: 9000020058959

    Osaka Prefectural Industrial Technology Research Institute (1989 from CiNii)

    Articles in CiNii:1

    • Tetrafluoroethylene oligomer-gold composite films prepared by Co-evaporation method. (1989)
  • OGAWA Soichi ID: 9000020061291

    Osaka Prifectural Industrial Technology Research Institute (1988 from CiNii)

    Articles in CiNii:1

    • Preperation of YBaCuO superconducting thin films by ion-beam-sputtering. (1988)
  • OGAWA Soichi ID: 9000020070699

    Osaka Prefectural Industrial Research Institute (1983 from CiNii)

    Articles in CiNii:1

    • The High Growth Rate Preparation of a-Si : H Films by Ion Beam Sputtering Method (1983)
  • OGAWA Soichi ID: 9000020073436

    Osaka Prefectural Industrial Research Institute (1981 from CiNii)

    Articles in CiNii:1

    • The Magnetic Properties of Vapor-deposited Co Film (1981)
  • OGAWA Soichi ID: 9000020073974

    Osaka Prefectural Industrial Reseach Institute (1981 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1981)
  • OGAWA Soichi ID: 9000020115973

    Osaka Industrial Promotion Organization (2003 from CiNii)

    Articles in CiNii:1

    • Electrical and Optical Properties of the AlN/Cu/AlN Multilayer Films by Sputtering (2003)
  • OGAWA Soichi ID: 9000020123211

    Osaka Prefectural Industrial Research Institute (1983 from CiNii)

    Articles in CiNii:1

    • Fabrication of Zr-N Thin Films by Reactive Ion Beam Sputtering (1983)
  • OGAWA Soichi ID: 9000020124416

    Osaka Prefectual Industrial Research Institute (1982 from CiNii)

    Articles in CiNii:1

    • Surface Modification of PET Films by Plasma Treatment (1982)
  • OGAWA Soichi ID: 9000020152625

    Industrial Research Institute of Osaka Prefectural (1989 from CiNii)

    Articles in CiNii:1

    • Surface modification of pitch based carbon fiber by low frequency(60Hz) plasma treatment. (1989)
  • OGAWA Soichi ID: 9000020158129

    Osaka Prefectural Industrial Research Institute (1987 from CiNii)

    Articles in CiNii:1

    • Zr-N films sputter deposited in pure nitrogen. (1987)
  • OGAWA Soichi ID: 9000020168313

    Osaka Prefectural Industrial Research Institute (1983 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1983)
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