Search Results1-4 of  4

  • OHIWA Tsunemi ID: 9000020061896

    Hitachi Maxell Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Properties of tantalum oxide thin films prepared by reactive sputtering. (1988)
  • OHIWA Tsunemi ID: 9000020124378

    Hitachi Maxell Corp. (1982 from CiNii)

    Articles in CiNii:1

    • Surface Modification of PET Films by Plasma Treatment (1982)
  • OHIWA Tsunemi ID: 9000020234228

    Hitachi Maxell, Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • Ta2O5 thin films preparation of reactive neutral beam sputter. Study on effects of N2 gas.:Study on Effects of N<SUB>2</SUB> Gas (1987)
  • OHIWA Tsunemi ID: 9000020276059

    Hitachi-Maxell Ltd. (1986 from CiNii)

    Articles in CiNii:1

    • アブストラクト (1986)
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