Search Results1-20 of  21

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  • Ohtake Hiroto ID: 9000025016598

    Articles in CiNii:1

    • Novel particle-reduction system in plasma-enhanced chemical vapor deposition process of interlayer dielectrics (Special issue: Solid state devices and materials) (2010)
  • Ohtake Hiroto ID: 9000025017409

    Articles in CiNii:1

    • Prediction of abnormal etching profile in high-aspect-ratio via/hole etching using on-wafer monitoring system (Special issue: Solid state devices and materials) (2010)
  • OHTAKE Hiroto ID: 9000000230667

    Silicon Systems Research Laboratories, NEC Corporation (1998 from CiNii)

    Articles in CiNii:1

    • Enhancement of Reactivity in Au Etching by Pulse-Time-Modulated Cl_2 Plasma (1998)
  • OHTAKE Hiroto ID: 9000001717669

    Silicon Systems Research Laboratories, NEC Corporation (1998 from CiNii)

    Articles in CiNii:1

    • Charge-Free and Dopant Dependence-Free Etching Processes Using Non-Maxwellian Electron Energy Distributions in Ultra-High-Frequency Plasma (1998)
  • OHTAKE Hiroto ID: 9000002174513

    System Devices Research Laboratories, NEC (2006 from CiNii)

    Articles in CiNii:1

    • High Performance SiN-MIM Decoupling Capacitors with Surface-smoothed Bottom Electrodes for High-speed MPUs (2006)
  • OHTAKE Hiroto ID: 9000005598433

    Department of Electrical Engineering, Keio University (1999 from CiNii)

    Articles in CiNii:1

    • Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge (1999)
  • OHTAKE Hiroto ID: 9000107388884

    System Devices Research Laboratories, NEC Corporation (2004 from CiNii)

    Articles in CiNii:1

    • Mechanical Property Control of Low-k Dielectrics for Diminishing Chemical Mechanical Polishing (CMP)-Related Defects in Cu-Damascene Interconnects (2004)
  • OHTAKE Hiroto ID: 9000347140390

    Department of Pharmacokinetics and Pharmacodynamics, University of Shizuoka (2014 from CiNii)

    Articles in CiNii:1

    • Photosafety assessment on benzophenone derivatives based on in vitro phototoxic risk asessments and dermal cassette-dosing pharmacokinetic study (2014)
  • OHTAKE Hiroto ID: 9000347194241

    Department of Pharmacokinetics and Pharmacodynamics, School of Pharmaceutical Science, University of Shizuoka (2015 from CiNii)

    Articles in CiNii:1

    • Photosafety assessment on dermally-applied chemicals based on photoreactivity and cassette-dosing pharmacokinetic data (2015)
  • Ohtake Hiroto ID: 9000025020793

    Articles in CiNii:1

    • Reduction in number of sparks generated in high-density plasma process by fixing the wall potential (2011)
  • Ohtake Hiroto ID: 9000258141386

    Silicon Systems Research Laboratories, NEC Corporation, 34 Miyukigaoka, Tsukuba, Ibaraki 305–8501, Japan (1998 from CiNii)

    Articles in CiNii:1

    • Enhancement of Reactivity in Au Etching by Pulse-Time-Modulated Cl2 Plasma. (1998)
  • Ohtake Hiroto ID: 9000258146810

    Department of Electrical Engineering, Keio University, 3–14–1 Hiyoshi, Yokohama 223–8522, Japan (1999 from CiNii)

    Articles in CiNii:1

    • Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge. (1999)
  • Ohtake Hiroto ID: 9000401656303

    Articles in CiNii:1

    • Simulation of a Pulse Time-Modulated Bulk Plasma inCl2 (1996)
  • Ohtake Hiroto ID: 9000401661443

    Articles in CiNii:1

    • Ion and Neutral Temperatures in a Novel Ultrahigh-Frequency Discharge Plasma (1996)
  • Ohtake Hiroto ID: 9000401671738

    Articles in CiNii:1

    • Enhancement of Reactivity in Au Etching by Pulse-Time-Modulated Cl2Plasma (1998)
  • Ohtake Hiroto ID: 9000401679732

    Articles in CiNii:1

    • Two-Dimensional Self-Consistent Simulation of a DC Magnetron Discharge (1999)
  • Ohtake Hiroto ID: 9000401786474

    Articles in CiNii:1

    • Novel Particle-Reduction System in Plasma-Enhanced Chemical Vapor Deposition Process of Interlayer Dielectrics (2010)
  • Ohtake Hiroto ID: 9000401786476

    Articles in CiNii:1

    • Prediction of Abnormal Etching Profile in High-Aspect-Ratio Via/Hole Etching Using On-Wafer Monitoring System (2010)
  • Ohtake Hiroto ID: 9000401795120

    Articles in CiNii:1

    • Reduction in Number of Sparks Generated in High-Density Plasma Process by Fixing the Wall Potential (2011)
  • Ohtake Hiroto ID: 9000402021088

    Articles in CiNii:1

    • Highly selective and precisely controlled aluminum etching by Ar/HBr/CH3F/O2gas chemistry (2014)
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