Search Results1-8 of  8

  • OHTOSHI Kenji ID: 9000004965853

    Toshiba Machine Co., Ltd. (1997 from CiNii)

    Articles in CiNii:1

    • The Effect of Down-Flow Cleaning Process on Materials Used in an EB System (1997)
  • OHTOSHI Kenji ID: 9000005577073

    Toshiba Research and Development Center (1996 from CiNii)

    Articles in CiNii:2

    • Recovery of SEM Image by In-Situ Cleaning of Contaminated Objective Aperture (1996)
    • Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process (1995)
  • OHTOSHI Kenji ID: 9000005716555

    Articles in CiNii:2

    • The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System (1997)
    • Particle Contamination Control Technology in Electron Beam Mask Writing System for Next-Generation Mask Fabrication (2002)
  • Ohtoshi Kenji ID: 9000258124998

    Toshiba Research and Development Center, 1, Komukai Toshiba–cho, Saiwai–ku, Kawasaki–shi 210, Japan (1995 from CiNii)

    Articles in CiNii:1

    • Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process. (1995)
  • Ohtoshi Kenji ID: 9000258134500

    Toshiba Machine Co., Ltd., 2068–3, Ohoka, Numazu, Shizuoka 410, Japan (1997 from CiNii)

    Articles in CiNii:1

    • The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System. (1997)
  • Ohtoshi Kenji ID: 9000401652290

    Articles in CiNii:1

    • Reduction of Electron Beam Drift Caused by Deflecting Electrode by Downflow Cleaning Process (1995)
  • Ohtoshi Kenji ID: 9000401657739

    Articles in CiNii:1

    • Recovery of SEM Image byIn-Situ Cleaning of Contaminated Objective Aperture (1996)
  • Ohtoshi Kenji ID: 9000401668029

    Articles in CiNii:1

    • The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System (1997)
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