Search Results1-20 of  71

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  • Okimura Kunio ID: 9000008588580

    Articles in CiNii:1

    • Experimental Study for Optimal Operation of Discharge Type Ion Source (1988)
  • Okimura Kunio ID: 9000024962494

    Articles in CiNii:1

    • Effect of annealing with Ar plasma irradiation for transparent conductive Nb-doped TiO2 films on glass substrate (Special issue: Recent advances in dry process and related technologies) (2009)
  • Okimura Kunio ID: 9000025014625

    Articles in CiNii:1

    • X-ray Diffraction Study of Electric Field-Induced Metal-Insulator Transition of Vanadium Dioxide Film on Sapphire Substrate (2006)
  • Okimura Kunio ID: 9000025030547

    Articles in CiNii:1

    • Changes in lattice parameters of VO2 films grown on c-plane Al2O3 substrates across metal-insulator transition (2009)
  • Okimura Kunio ID: 9000025035361

    Articles in CiNii:1

    • Time-dependent characteristics of electric field-induced metal-insulator transition of planer VO2/c-Al2O3 structure (2007)
  • Kunio Okimura ID: 9000398982245

    Graduate School of Engineering, Tokai Univ (2018 from CiNii)

    Articles in CiNii:1

    • Oriented growth of VO<sub>2</sub> films on Si substrates by biased reactive sputtering after the initial growth of VO<sub>x</sub> (x>2) phase (2018)
  • OKIMURA Kunio ID: 1000000194473

    Department of Electronics, Tokai Unviersity (1999 from CiNii)

    Articles in CiNii:13

    • Optical Emission Spectroscopy During the Deposition Process of SiO_2 Using Tetraethyl Orthosilicate/N_2O Plasma Enhanced Chemical Vapor Deposition (1995)
    • Mechanical Properties of TiO_2-Coated Austenitic Type 304 Stainless Steels (1997)
    • Superior Corrosion Properties of TiO_2-Coated Austenitic Type 304 Stainless Steels (1998)
  • OKIMURA Kunio ID: 9000000326561

    Tokai University (2000 from CiNii)

    Articles in CiNii:1

    • Fabrication of Antireflection Structures on Single Crystalline Silicon Surface and Its Reflectance (2000)
  • OKIMURA Kunio ID: 9000005464856

    Department of Electronic and Electrical Engineering, School of Engineering, Tokai University (2011 from CiNii)

    Articles in CiNii:13

    • Measurement of Ti Atom Densities Using Atomic Absorption Method in Ti-O_2 Magnetron Sputtering (2000)
    • Photochemical Dissociation of Organic Silicon Source using Xe_2 Excimer Lamp in Gas Phase (2000)
    • Photocatalytic Effects of TiO_2 Films Prepared by Reactive Magnetron Sputtering (2000)
  • OKIMURA Kunio ID: 9000005545420

    Department of Electronics, Tokai University (2002 from CiNii)

    Articles in CiNii:2

    • Role of He Gas Mixture the Growth of Anatase and Rutile TiO_2 Films in RF Magnetron Sputtering (1997)
    • Optical Absorption Measurements of Sputtered Titanium Ions in RF Magnetron Sputtering (2002)
  • OKIMURA Kunio ID: 9000005569641

    Fukui National College of Technology (1995 from CiNii)

    Articles in CiNii:1

    • Preparation of Rutile TiO_2 Films by RF Magnetron Sputtering (1995)
  • OKIMURA Kunio ID: 9000020103838

    Department of Electronics, Tokai University (2001 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (2001)
  • OKIMURA Kunio ID: 9000020321488

    Department of Electronics, Tokai University (2000 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (2000)
  • OKIMURA Kunio ID: 9000021531019

    Department of Electronics, Tokai University (1999 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (1999)
  • OKIMURA Kunio ID: 9000021580971

    Fukui National College of Technology (1998 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (1998)
  • OKIMURA Kunio ID: 9000107335513

    Department of Electronics, Tokai University (2003 from CiNii)

    Articles in CiNii:1

    • Ion Densities and Ionization Fractions of Sputtered Titanium in Inductively Coupled Plasma Assisted Sputtering (2003)
  • OKIMURA Kunio ID: 9000107343593

    Department of Electronics, Tokai University (2005 from CiNii)

    Articles in CiNii:1

    • In-Plane Orientation and Annealing Behavior of Rutile TiO_2 Films on MgO Substrate Prepared by Inductively Coupled Plasma-Assisted Sputtering (2005)
  • OKIMURA Kunio ID: 9000107347459

    Department of Electronics, Tokai University (2004 from CiNii)

    Articles in CiNii:1

    • Epitaxial Growth of Rutile TiO_2 Films on MgO Substrate in Inductively Coupled Plasma-Assisted Sputtering (2004)
  • OKIMURA Kunio ID: 9000107355703

    Fukui National College of Technology (1997 from CiNii)

    Articles in CiNii:1

    • Deposition of High-Quality TiO_2 Films by RF Magnetron Sputtering with an Auxiliary Permanent Magnet (1997)
  • OKIMURA Kunio ID: 9000107377668

    Department of Electronics, Tokai University (2003 from CiNii)

    Articles in CiNii:1

    • Growth of Highly Oriented CoCrTa films by Inductively Coupled Plasma-Assisted Sputtering (2003)
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