Search Results1-20 of  71

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  • Oyama Toshiyuki ID: 9000005699663

    Articles in CiNii:2

    • Synthesis of Fine Particles of Sn,Ti and V Oxides by Laser-induced Vapor-phase Reaction (1997)
    • Characterization of Positive-type Photosensitive Polyimide Films Formed by Electrodeposition Coating (2004)
  • Oyama Toshiyuki ID: 9000009661151

    Articles in CiNii:1

    • Photosensitive Polyetherimide(Ultem) Based on Reaction Development Patterning(RDP) (2002)
  • Oyama Toshiyuki ID: 9000010734720

    Articles in CiNii:1

    • A novel mechanism to afford photosensitivity to unfunctionalized polyimides: negative-tone reaction development patterning (2009)
  • Oyama Toshiyuki ID: 9000016968054

    Articles in CiNii:1

    • Development of thermostable photosensitive polycarbonates based on negative-tone reaction development patterning (2010)
  • Oyama Toshiyuki ID: 9000018623439

    Articles in CiNii:1

    • Photosensitive sulfonated polyimides utilizing alkaline-developable negative-tone reaction development patterning (2011)
  • Oyama Toshiyuki ID: 9000018623542

    Articles in CiNii:1

    • Positive-tone pattern formation from vinyl polymers with maleimide group by reaction development patterning (2011)
  • Oyama Toshiyuki ID: 9000018998635

    Articles in CiNii:1

    • Development of Photosensitive Vinyl Polymers with Imide Group Based on Reaction Development Patterning (2012)
  • Oyama Toshiyuki ID: 9000298893029

    Articles in CiNii:1

    • Utilization of Polyarylates Having Chemically Introduced Diazonaphthoquinone Structure for Reaction Development Patterning (2015)
  • Oyama Toshiyuki ID: 9000390930131

    Articles in CiNii:1

    • Photosensitive engineering plastics based on reaction development patterning (2018)
  • OYAMA Toshiyuki ID: 9000000474660

    Department of Polymer Chemistry, Graduate School of Engineering, Kyoto University (1999 from CiNii)

    Articles in CiNii:2

    • Novel Aprotic Polar Polymers IV. Synthesis of Poly[(N-bis(dimethylamino)phosphorylethylenimine] as a Polymer Homolog of Hexamethylphosphoramide (1998)
    • Novel Aprotic Polar Polymers V. Synthesis of Poly(HMPA) by Ring-Opening Polymerization (1999)
  • OYAMA Toshiyuki ID: 9000001315449

    Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University (2004 from CiNii)

    Articles in CiNii:1

    • Synthesis of Novel Reactive Polymers Having Oxirane Structure in the Main Chain by Polycondensation of Bis(sulfonium ylide) with Dialdehyde (2004)
  • OYAMA Toshiyuki ID: 9000001887225

    Department of Advanced Materials Chemistry, Faculty of Engineering, Yokohama National University (2007 from CiNii)

    Articles in CiNii:1

    • Photosensitive Polyesterimides Based on Reaction Development Patterning (2007)
  • OYAMA Toshiyuki ID: 9000001995149

    Meisei University, Global Environment Science Center (2007 from CiNii)

    Articles in CiNii:5

    • Photo Catalytic Degradation of Bisphenol A under Solar Exposure (2007)
    • 光触媒を利用した有害物質の分解浄化 (2004)
    • 太陽光エネルギーを利用した水質汚染物質の光触媒分解処理 (特集2 光触媒技術の最新動向と応用分野) (2006)
  • OYAMA Toshiyuki ID: 9000003015620

    Articles in CiNii:24

    • Novel Technique for Changing Engineering Plastics to Photosensitive Polymers : Reaction Development Patterning (2006)
    • Toughening of Acid Anhydride-cured Epoxy Resin by Modification with Poly[poly (N-phenylmaleimide-alt-styrene)-block-polyoxyethylene] Prepared by in situ Polymerization (2006)
    • Toughening of Epoxy Resin by Modification with Poly[poly (N-phenylmaleimide-alt-styrene)-graft-polyethylene oxide] Prepared by in situ Polymerization (2008)
  • OYAMA Toshiyuki ID: 9000005623272

    The Institute of Physical and Chemical Research (RIKEN) (1994 from CiNii)

    Articles in CiNii:1

    • Short Range Order Structure of Amorphous Boron Prepared by Various Methods : (1994)
  • OYAMA Toshiyuki ID: 9000017379159

    Faculty of Engineering, Department of Advanced Materials Chemistry, Yokohama National University (2010 from CiNii)

    Articles in CiNii:3

    • Development of chemically amplified reaction development patterning (2010)
    • Examination of pattern-forming conditions in negative-tone reaction development patterning (2009)
    • Effect of maleimide compounds on pattern-forming property of photosensitive polyimide based on negative-tone reaction development patterning (2010)
  • OYAMA Toshiyuki ID: 9000017677507

    東京大学大学院工学系研究科 (2012 from CiNii)

    Articles in CiNii:4

    • Report of JSMF Summer Student Seminar 2010 (2010)
    • An Essay about International Conference on Multiphase Flow 2010 (2010)
    • An Essay about Stay in KTH, Sweden (2011)
  • OYAMA Toshiyuki ID: 9000021547732

    The Institute of Physical and Chemical Research (1975 from CiNii)

    Articles in CiNii:1

    • Isotope Separation Effect of Granular Type Barriers (1975)
  • OYAMA Toshiyuki ID: 9000021553738

    The Institute of Physical and Chemical Research (1989 from CiNii)

    Articles in CiNii:1

    • Infrared Multiphoton Dissociation of UF<SUB>6</SUB> in Supersonic Nozzle Reactor (1989)
  • OYAMA Toshiyuki ID: 9000021590461

    Institute of Physical and Chemical Research (1989 from CiNii)

    Articles in CiNii:1

    • Radical reaction mechanisms in infrared multiphoton dissociation of UF6 with scavenger gases. (1989)
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