Search Results1-20 of  305

  • Ohmi Tadahiro ID: 9000009290785

    Articles in CiNii:1

    • Scientific Semiconductor Manufacturing Using Process Gases (1997)
  • Ohmi Tadahiro ID: 9000009290895

    Articles in CiNii:1

    • New Era of Semiconductor Manufacturing(3) Breakthrough for Everlasting Prosperity of Semiconductor Industry--Proposal of very compact manufacturing system for 300 mm wafer from Tohoku University (1998)
  • Ohmi Tadahiro ID: 9000009290943

    Articles in CiNii:1

    • New Era of Semiconductor Manufacturing (1)Breakthrough for Everlasting Prosperity of Semiconductor Industry --Proposal of very compact manufacturing system for 300 mm wafer from Tohoku University (1997)
  • Ohmi Tadahiro ID: 9000009290945

    Articles in CiNii:1

    • New Era of Semiconductor Manufacturing(2)Breakthrough for Everlasting Prosperity of Semiconductor Industry--Proposal of Zero Emission Semiconductor Fab. Operation--″Fluorine Circulation″ (1997)
  • OHMI TADAHIRO ID: 9000256198429

    Department of Electronics, Faculty of Engineering, Tohoku University (1992 from CiNii)

    Articles in CiNii:1

    • Advanced Ultvapure Water Distribution Technology for ULSI Manufacturing (1992)
  • OHMI Tadahiro ID: 9000000227227

    Articles in CiNii:3

    • Formatin Process of Highly Reliable Ultra-Thin Gate Oxide (1996)
    • Ultrashallow and Low-Leakage p^+n Junction Formation by Plasma Immersion Ion Implantation (PIII) and Low-Temperature Post-Implantation Annealing (2001)
    • Ultra-Shallow and Low-Leakage p^+n Junctions Formation by Plasma Immersion Ion Implantation (PIII) and Low-Temperature Post-Implantation Annealing (2000)
  • OHMI Tadahiro ID: 9000001505947

    New Industry Creation Hatchery Center, Tohoku University (2001 from CiNii)

    Articles in CiNii:1

    • Source/Drain Dopant Deactivation and Junction Degradation by Energetic Ions in Plasma Processes (2001)
  • OHMI Tadahiro ID: 9000001558422

    Faculty of Engineering, Tohoku Univ. (1996 from CiNii)

    Articles in CiNii:1

    • Quick External Leakage Inspection Method for Gas Supplying System in Semiconductor Facility Using Atmospheric Pressure Ionization Mass Spectrometer (1996)
  • OHMI Tadahiro ID: 9000001718711

    Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • PREFACE (2000)
  • OHMI Tadahiro ID: 9000001719136

    New Industry Creation Hatchery Center (NICHe), Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • An Advanced Room Temperature Cleaning Using a pH Controlled Ozonated Ultrapure Water (2000)
  • OHMI Tadahiro ID: 9000001719139

    Department of Electronic Engineering, Graduate School of Engineering, Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • Strategy in Cleaning Processes for Future Materials (2000)
  • OHMI Tadahiro ID: 9000001719197

    New Industry Creation Hatchery Center (NICHe), Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • Perfectly Etching Uniformity Control of Various Doped Oxide Films Using an Anhydrous HF Gas (2000)
  • OHMI Tadahiro ID: 9000001719561

    New Industry Creation Hatchery Center, Tohoku University (2000 from CiNii)

    Articles in CiNii:1

    • A Dynamically Reconfigurable Processor with Multi-Mode Operation Based on Newly Developed Full-Adder/D-Flip-Flop Merged Module (FDMM) (2000)
  • OHMI Tadahiro ID: 9000001720177

    Department of Electronic Engineering, Faculty of Engineering, Tohoku University (1996 from CiNii)

    Articles in CiNii:1

    • Native Oxide Growing Behavior on Si Crystal Structure and Resistivity (1996)
  • OHMI Tadahiro ID: 9000001720285

    Department of Electronic Engineering, Faculty of Engineering, Tohoku University (1996 from CiNii)

    Articles in CiNii:1

    • Contamination-Free Physical Resist Stripping by Megasonic/IPA/Fluoride Enhanced Life-off Processing (1996)
  • OHMI Tadahiro ID: 9000001721203

    Department of Electronic Engineering, Tohoku University (1995 from CiNii)

    Articles in CiNii:1

    • Four-Terminal Device Electronics for Intelligent Silicon Integrated Systems (1995)
  • OHMI Tadahiro ID: 9000001721867

    Department of Electronic Engineering, Tohoku University (1995 from CiNii)

    Articles in CiNii:1

    • Time-Dependent Dielectric Degradation (TDDD) Influenced by Ultrathin Oxidation Process (1995)
  • OHMI Tadahiro ID: 9000001722126

    Department of Electronic Engineering, Faculty of Engineering, Tohoku University (1995 from CiNii)

    Articles in CiNii:1

    • Modeling and Analysis of RF Plasma Using Electrical Equivalent Circuit (1995)
  • OHMI Tadahiro ID: 9000001722581

    Department of Electronics, Faculty of Engineering, Tohoku University (1995 from CiNii)

    Articles in CiNii:1

    • Specialty Gas Interactions with Various Silicon Surfaces (1995)
  • OHMI Tadahiro ID: 9000001927864

    Department of Electronic Engineering, Faculty of Engineering, Tohoku University (1997 from CiNii)

    Articles in CiNii:1

    • Neuron-MOS Parallel Search Hardware for Real-Time Signal Processing (1997)
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