Search Results1-20 of  100

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  • Oizumi Hiroaki ID: 9000009566051

    Articles in CiNii:1

    • Evaluation of the Outgassing from Resists at the EUV Wavelength (2001)
  • Oizumi Hiroaki ID: 9000010400468

    Articles in CiNii:1

    • Evaluation of new molecular resist for EUV lithography (2007)
  • Oizumi Hiroaki ID: 9000010553285

    Articles in CiNii:1

    • Development of new negative-tone molecular resists based on calixarene for EUV lithography (2008)
  • Oizumi Hiroaki ID: 9000010734459

    Articles in CiNii:1

    • Advancements in EUV resist materials and processing (2009)
  • Oizumi Hiroaki ID: 9000016968090

    Articles in CiNii:1

    • Progress of resist materials and process for hp 2x-nm devices using EUV lithography (2010)
  • Oizumi Hiroaki ID: 9000025042155

    Articles in CiNii:1

    • Atomic hydrogen cleaning of surface Ru oxide formed by extreme ultraviolet irradiation of Ru-capped multilayer mirrors in H2O ambience (2007)
  • Oizumi Hiroaki ID: 9000025057721

    Articles in CiNii:1

    • Extreme ultraviolet resist outgassing quantification verification by resist film analysis (Special issue: Microprocesses and nanotechnology) (2009)
  • Oizumi Hiroaki ID: 9000025083190

    Articles in CiNii:1

    • Development of new positive-tone molecular resists based on fullerene derivatives for extreme ultraviolet lithography (Special issue: Microprocesses and nanotechnology) (2010)
  • OIZUMI Hiroaki ID: 9000001772445

    ASET (2006 from CiNii)

    Articles in CiNii:1

    • Development of Molecular Resist for EUV Lithography (2006)
  • OIZUMI Hiroaki ID: 9000003305335

    Articles in CiNii:11

    • Theoretical Estimation of Absorption Coefficients of Various Polymers at 13 nm (1999)
    • F-K XANES Studies of Alkaline-Earth Fluorides (1985)
    • Influence of Oxygen upon Radiation Durability of SiN X-Ray Mask Membranes : Lithography Technology : (1991)
  • OIZUMI Hiroaki ID: 9000005841441

    ASET EUVL Laboratory (2002 from CiNii)

    Articles in CiNii:1

    • Measurement of Temperature Rise of Quartz Plate during Synchrotron Radiation Irradiation Using Infrared Camera (2002)
  • OIZUMI Hiroaki ID: 9000018185882

    Articles in CiNii:2

    • Relationship between Chemical Gradient and Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resist (2010)
    • Assessment and extendibility of chemically amplified resists for extreme ultraviolet lithography: consideration of nanolithography beyond 22nm half-pitch (2011)
  • OIZUMI Hiroaki ID: 9000018650178

    Semiconductor Leading Edge technologies, Inc. (Selete) Research Department 3 (2011 from CiNii)

    Articles in CiNii:1

    • Multicomponent negative-type photoresist based on Noria analog with 12 ethoxy groups (2011)
  • OIZUMI Hiroaki ID: 9000019183878

    高知県農業振興部 (2012 from CiNii)

    Articles in CiNii:1

    • Responses of Hemerocallis to agricultural management on levees (2012)
  • Oizumi Hiroaki ID: 9000004967444

    SORTEC (1994 from CiNii)

    Articles in CiNii:1

    • Mechanism and prevention methods of resist pattern collapse (1994)
  • Oizumi Hiroaki ID: 9000024959171

    Articles in CiNii:1

    • Analysis of Dose-Pitch Matrices of Line Width and Edge Roughness of Chemically Amplified Fullerene Resist (2011)
  • Oizumi Hiroaki ID: 9000024960135

    Articles in CiNii:1

    • Extreme Ultraviolet Resist Fabricated Using Water Wheel-Like Cyclic Oligomer with Pendant Adamantyl Ester Groups (2011)
  • Oizumi Hiroaki ID: 9000025013536

    Articles in CiNii:1

    • Resist parameter extraction from line-and-space patterns of chemically amplified resist for extreme ultraviolet lithography (2010)
  • Oizumi Hiroaki ID: 9000025083245

    Articles in CiNii:1

    • Reconstruction of latent images from dose-pitch matrices of line width and edge roughness of chemically amplified resist for extreme ultraviolet lithography (2010)
  • Oizumi Hiroaki ID: 9000025097400

    Articles in CiNii:1

    • Latent image created using small-field exposure tool for extreme ultraviolet lithography (2009)
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