Search Results1-20 of  85

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  • Okamoto Kazumasa ID: 9000010734598

    Articles in CiNii:1

    • Nano-fabrication and functionalization of crosslinked PTFE using focused ion beam (2009)
  • Okamoto Kazumasa ID: 9000018453571

    Articles in CiNii:1

    • Dynamics of radical cation of poly(styrene acrylate)-based chemically amplified resist for extreme ultraviolet and electron beam lithography (Special issue: Microprocesses and nanotechnology) (2011)
  • Okamoto Kazumasa ID: 9000025057462

    Articles in CiNii:1

    • Correlation between C37 parameters and acid yields in chemically amplified resists upon exposure to 75keV electron beam (Special issue: Microprocesses and nanotechnology) (2009)
  • Okamoto Kazumasa ID: 9000025058043

    Articles in CiNii:1

    • Dynamics of radical cation of poly(4-hydroxystyrene) and its copolymer for extreme ultraviolet and electron beam resists (Special issue: Microprocesses and nanotechnology) (2009)
  • Okamoto Kazumasa ID: 9000025059053

    Articles in CiNii:1

    • Effect of molecular structure on depth profile of acid generator distribution in chemically amplified resist films (Special issue: Microprocesses and nanotechnology) (2009)
  • Okamoto Kazumasa ID: 9000025066094

    Articles in CiNii:1

    • Effect of Ultrahigh-Density Ionization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser (2012)
  • Okamoto Kazumasa ID: 9000241566357

    Articles in CiNii:1

    • Deprotonation of Poly(4-hydroxystyrene) Intermediates : Pulse Radiolysis Study of Extreme Ultraviolet and Electron Beam Resist (Special Issue : Microprocesses and Nanotechnology) (2013)
  • OKAMOTO Kazumasa ID: 9000001223247

    The Institute of Scientific and Industrial Research, Osaka University (2008 from CiNii)

    Articles in CiNii:9

    • Subpicosecond Pulse Radiolysis Study of Geminate Ion Recombination in Liquid Benzene (2003)
    • Effects of Dielectric Constant on Acid Generation in Chemically Amplified Resists for Post-Optical Lithography (2005)
    • Reaction Mechanisms of Brominated Chemically Amplified Resists (2005)
  • OKAMOTO Kazumasa ID: 9000107341171

    The Institute of Scientific and Industrial Research, Osaka University (2004 from CiNii)

    Articles in CiNii:1

    • Pulse Radiolysis Study on Proton and Charge Transfer Reactions in Solid Poly(methyl methacrylate) (2004)
  • OKAMOTO Kazumasa ID: 9000107349822

    The Institute of Scientific and Industrial Research, Osaka University (2004 from CiNii)

    Articles in CiNii:1

    • Proton Dynamics in Chemically Amplified Electron Beam Resists (2004)
  • OKAMOTO Kazumasa ID: 9000107349893

    The Institute of Scientific and Industrial Research, Osaka University (2004 from CiNii)

    Articles in CiNii:1

    • Polymer Screening Method for Chemically Amplified Electron Beam and X-Ray Resists (2004)
  • OKAMOTO Kazumasa ID: 9000107350100

    The Institute of Scientific and Industrial Research, Osaka University (2004 from CiNii)

    Articles in CiNii:1

    • Effects of Ester Groups on Proton Generation and Diffusion in Polymethacrylate Matrices (2004)
  • OKAMOTO Kazumasa ID: 9000107365174

    Faculty of Engineering, Hokkaido University (2012 from CiNii)

    Articles in CiNii:1

    • Effect of Ultrahigh-Density lonization of Resist Films on Sensitivity Using Extreme-Ultraviolet Free-Electron Laser (2012)
  • OKAMOTO Kazumasa ID: 9000107374831

    The Institute of Scientific and Industrial Research, Osaka University (2005 from CiNii)

    Articles in CiNii:1

    • Potential Cause of Inhomogeneous Acid Distribution in Chemically Amplified Resists for Post Optical Lithography (2005)
  • OKAMOTO Kazumasa ID: 9000107374904

    The Institute of Scientific and Industrial Research, Osaka University (2005 from CiNii)

    Articles in CiNii:1

    • Dependence of Acid Yield on Acid Generator in Chemically Amplified Resist for Post-Optical Lithography (2005)
  • OKAMOTO Kazumasa ID: 9000107386443

    The Institute of Scientific and Industrial Research, Osaka University (2006 from CiNii)

    Articles in CiNii:1

    • Relationship between Acid Generator Concentration and Acid Yield in Chemically Amplified Electron Beam Resist (2006)
  • OKAMOTO Kazumasa ID: 9000375890462

    N.I.T. Suzuka Adv. Eng. (2017 from CiNii)

    Articles in CiNii:1

    • Development of Wearable Posture Assist Device with New Three-Mode Spring Mechanism (2017)
  • OKAMOTO Kazumasa ID: 9000392505601

    NIT Suzuka Adv. Eng. (2016 from CiNii)

    Articles in CiNii:1

    • Proposal of Two-Wire-Three-Mode Spring Mechanism and Application to Wearable Posture Assist Device for Light-duty Work (2016)
  • Okamoto Kazumasa ID: 9000020340839

    Articles in CiNii:1

    • A Clinical Observation of Complete Denture Wearers, Part 1 (1979)
  • Okamoto Kazumasa ID: 9000024940469

    Articles in CiNii:1

    • Radiation chemistry of fluoronaphthalene as a candidate for absorption enhancement component of chemically amplified extreme ultraviolet resists (2010)
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