Search Results1-2 of  2

  • Okuma Kazumasa ID: 9000402043207

    Articles in CiNii:1

    • Atomic layer etching of silicon nitride using cyclic process with hydrofluorocarbon chemistry (2017)
  • Okuma Kazumasa ID: 9000402049331

    Articles in CiNii:1

    • Anisotropic selective etching between SiGe and Si (2018)
Page Top