Search Results1-8 of  8

  • PARK Seong-Hyung ID: 9000004965625

    LG Semicon.,Ltd. (1997 from CiNii)

    Articles in CiNii:2

    • Defects study of retrograde twin well CMOS that has MeV ion implanted buried layer (1997)
    • Defects study of retrograde twin well CMOS that has MeV ion implanted buried layer (1997)
  • PARK Seong-Hyung ID: 9000005117537

    Dept. of Electronics Engineering, Chungnam National University (2010 from CiNii)

    Articles in CiNii:9

    • Abnormal Oxidation of Nickel Silicide on N-Type Substrate and Effect of Preamorphization Implantation (2004)
    • Low Temperature Formation of Highly Thermal Immune Ni Germanosilicide Using NiPt Alloy with Co Over-layer in Si_<1-x>Ge_x according to Different Ge Fractions (x) (2004)
    • Ramping Amplitude Multi-Frequency Charge Pumping Technique for Silicon-Oxide-Nirtride-Oxide-Silicon Flash EEPROM Cell Transistors (2007)
  • PARK Seong-Hyung ID: 9000107352461

    System IC R&D Division, Hynix Semiconductor (2004 from CiNii)

    Articles in CiNii:1

    • Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology (2004)
  • PARK Seong-Hyung ID: 9000107375227

    Articles in CiNii:1

    • Analysis of Transfer Gate in CMOS Image Sensor (2010)
  • Park Seong-Hyung ID: 9000258169711

    System IC R&D Division, Hynix Semiconductor (2004 from CiNii)

    Articles in CiNii:1

    • Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology (2004)
  • Park Seong-Hyung ID: 9000258170130

    System IC R&D Center, Hynix Semiconductor Inc. (2004 from CiNii)

    Articles in CiNii:1

    • Abnormal Oxidation of Nickel Silicide on N-Type Substrate and Effect of Preamorphization Implantation (2004)
  • Park Seong-Hyung ID: 9000401730246

    Articles in CiNii:1

    • Abnormal Oxidation of Nickel Silicide on N-Type Substrate and Effect of Preamorphization Implantation (2004)
  • Park Seong-Hyung ID: 9000401731707

    Articles in CiNii:1

    • Characterization of Nickel-Silicide Dependence on the Substrate Dopants for Nanoscale Complementary Metal Oxide Semiconductor Technology (2004)
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