Search Results1-20 of  29

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  • SAITOU Norio ID: 9000002956758

    Hitachi High-Technologies Corp. (2005 from CiNii)

    Articles in CiNii:10

    • Metrological Technologies Using Laser in Semiconductor Lithography (1998)
    • The present and future issues in e-beam direct writing technology (1998)
    • Hitachi High-Technologies Corporation / Hitachi, Ltd., Central Research Laboratory (2004)
  • SAITOU Norio ID: 9000004872333

    Central Research Laboratory, Hitachi. Ltd. (2003 from CiNii)

    Articles in CiNii:25

    • Electron Beam Lithography-Present and Future (1996)
    • Preparatory Study for the Matrix-Pattern Imaging, BE System (2003)
    • High Speed Electron Beam Cell Projection Exposure System (Special Issue on Quarter Micron Si Device and Process Technologies) (1994)
  • SAITOU Norio ID: 9000014078127

    多摩緑成会病院整形外科 (2006 from CiNii)

    Articles in CiNii:1

    • Surface replacement arthroplasty and collateral ligament reconstruction to the proximal interphalangeal joint with old dislocation of the little finger : A case report (2006)
  • Saitou Norio ID: 9000392676079

    Articles in CiNii:1

    • Monte Carlo Simulation for the Energy Dissipation Profiles of 5–20 keV Electrons in Layered Structures (1973)
  • Saitou Norio ID: 9000392681280

    Articles in CiNii:1

    • Mask Fabrication with Submicron Line-Width by Electron Beam (1971)
  • Saitou Norio ID: 9000392681550

    Articles in CiNii:1

    • Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials (1972)
  • Saitou Norio ID: 9000392682263

    Articles in CiNii:1

    • Analysis of Trapezoid Distortion due to Charge-Up in Electron Beam Recording (1971)
  • Saitou Norio ID: 9000392686091

    Articles in CiNii:1

    • Role of Ion Bombardment in Field Emission Current Instability (1982)
  • Saitou Norio ID: 9000392717077

    Articles in CiNii:1

    • Thermal Characteristics of Si Mask for EB Cell Projection Lithography (1992)
  • Saitou Norio ID: 9000392717091

    Articles in CiNii:1

    • Error Analysis in Electron Beam Lithography System —Thermal Effects on Positioning Accuracy— (1992)
  • Saitou Norio ID: 9000392720958

    Articles in CiNii:1

    • The Requirements for Future Electron-Beam Reticle Fabrication Systems from an Error Analysis Viewpoint (1993)
  • Saitou Norio ID: 9000392720991

    Articles in CiNii:1

    • Stitching Error Analysis in an Electron Beam Lithography System: Column Vibration Effect (1993)
  • Saitou Norio ID: 9000401575062

    Articles in CiNii:1

    • Mask Fabrication with Submicron Line-Width by Electron Beam (1971)
  • Saitou Norio ID: 9000401575220

    Articles in CiNii:1

    • Phase-Hologram Fabrication with a Computer-Controlled Electron Beam (1971)
  • Saitou Norio ID: 9000401575378

    Articles in CiNii:1

    • Analysis of Trapezoid Distortion due to Charge-Up in Electron Beam Recording (1971)
  • Saitou Norio ID: 9000401575683

    Articles in CiNii:1

    • Fine Chromium Grating Directly Made by Irradiating Electron Beam (1971)
  • Saitou Norio ID: 9000401575848

    Articles in CiNii:1

    • Change of Apparent Sensitivity of an Electron Resist Due to Backing Materials (1972)
  • Saitou Norio ID: 9000401577801

    Articles in CiNii:1

    • 1973-06 (1973)
  • Saitou Norio ID: 9000401590327

    Articles in CiNii:1

    • Role of Ion Bombardment in Field Emission Current Instability (1982)
  • Saitou Norio ID: 9000401629987

    Articles in CiNii:1

    • Error Analysis in Electron Beam Lithography System -Thermal Effects on Positioning Accuracy- (1992)
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