Search Results1-20 of  87

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  • Setsuhara Yuichi ID: 9000018880542

    Articles in CiNii:1

    • Effects of Irradiation with Ions and Photons in Ultraviolet-Vacuum Ultraviolet Regions on Nano-Surface Properties of Polymers Exposed to Plasmas (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials) (2012)
  • Setsuhara Yuichi ID: 9000019044234

    Articles in CiNii:1

    • Low-Temperature Deposition of Zinc Oxide Film by Plasma-Assisted Mist Chemical Vapor Deposition (Special Issue : Dry Process) (2012)
  • Setsuhara Yuichi ID: 9000024939474

    Articles in CiNii:1

    • Combinatorial analysis of plasma-surface interactions of poly(ethylene terephthalate) with X-ray photoelectron spectroscopy (Special issue: Dry process) (2010)
  • Setsuhara Yuichi ID: 9000024942503

    Articles in CiNii:1

    • Plasma-Assisted Mist Chemical Vapor Deposition of Zinc Oxide Films Using Solution of Zinc Acetate (Special Issue : Advanced Plasma Science and its Applications for Nitrides and Nanomaterials) (2013)
  • Setsuhara Yuichi ID: 9000241877349

    Articles in CiNii:1

    • Plasma Interactions with Organic Materials in Liquid through Plasma/Liquid Interface (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials) (2013)
  • Setsuhara Yuichi ID: 9000241877541

    Articles in CiNii:1

    • Plasma-Enhanced Reactive Magnetron Sputtering Assisted with Inductively Coupled Plasma for Reactivity-Controlled Deposition of Microcrystalline Silicon Thin Films (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials) (2013)
  • SETSUHARA Yuichi ID: 9000001837979

    Osaka University, Joining and Welding Research Institute (2007 from CiNii)

    Articles in CiNii:2

    • Effects of Antenna Size and Configurations in Large-Area RF Plasma Production with Internal Low-Inductance Antenna Units (2006)
    • Large-Area and High-Speed Deposition of Microcrystalline Silicon Film by Inductive Coupled Plasma using Internal Low-Inductance Antenna (2007)
  • SETSUHARA Yuichi ID: 9000005583578

    Joining and Welding Research Institute, Osaka University (1997 from CiNii)

    Articles in CiNii:1

    • Fromation of Carbon Nitride Films by Helicon Wave Plasma Enhanced DC Sputtering (1997)
  • SETSUHARA Yuichi ID: 9000006607131

    Osaka University (1995 from CiNii)

    Articles in CiNii:1

    • Effect of Magnetic Mirror Plasma Confinement on Microwave Electron Cyclotron Resonance/D.C. Discharge for Low Pressure Sputtering(Physics, Process, Instrument & Measurements) (1995)
  • SETSUHARA Yuichi ID: 9000006609769

    Osaka University (1991 from CiNii)

    Articles in CiNii:1

    • Ion and Neutral Particle Diagnostics in Reactive ECR Plasma(Physics, Process, Instruments & Measurements) (1991)
  • SETSUHARA Yuichi ID: 9000006610108

    Osaka University (1994 from CiNii)

    Articles in CiNii:1

    • Formation and Structure of Crystalline Phase TiB_2 Films by Ion Beam Assisted Deposition(Physics, Process, Instrument & Measurements) (1994)
  • SETSUHARA Yuichi ID: 9000015594388

    Joining and Welding Research Institute, Osaka University (2003 from CiNii)

    Articles in CiNii:1

    • Tribological Property of CeO_2 Films Prepared by Ion-Beam-Assisted Deposition (2003)
  • SETSUHARA Yuichi ID: 9000016652188

    Joining and Welding Research Institute, Osaka University (2009 from CiNii)

    Articles in CiNii:1

    • Combinatorial Plasma Etching Process (2009)
  • SETSUHARA Yuichi ID: 9000017368807

    大阪大学 (2004 from CiNii)

    Articles in CiNii:2

    • Plazma (2003)
    • "特集/エレクトロニクス産業を支える表面技術"の企画に当たって (2004)
  • SETSUHARA Yuichi ID: 9000018716159

    Kyoto University (2004 from CiNii)

    Articles in CiNii:1

    • Formation of polycrystalline silicon film by Inductively-Coupled Plasma using low-inductance internal antennas (2004)
  • SETSUHARA Yuichi ID: 9000020755731

    Articles in CiNii:1

    • Development of wolter type 1 replicated X-ray optics. (1988)
  • SETSUHARA Yuichi ID: 9000022062475

    Department of Aeronautics and Astronautics, Kyoto University|Present Address : Joining and Welding Research Institute, Osaka University (2004 from CiNii)

    Articles in CiNii:1

    • Etching of High Dielectric Constant HfO<sub>2</sub> Thin Films in Inductively Coupled Fluorocarbon Plasmas (2004)
  • SETSUHARA Yuichi ID: 9000107356031

    Joining and Welding Research Institute, Osaka University (1997 from CiNii)

    Articles in CiNii:1

    • Measurement of Ion Energy Distribution Functions in an Radio Frequency Plasma Excited with an m = 0 Mode Helical Antenna and Thin Film Preparation (1997)
  • SETSUHARA Yuichi ID: 9000107390214

    Joining and Welding Research Institute, Osaka University (2006 from CiNii)

    Articles in CiNii:1

    • Characterization of Inductively-Coupled RF Plasma Sources with Multiple Low-Inductance Antenna Units (2006)
  • SETSUHARA Yuichi ID: 9000247085554

    Osaka Univ. (1989 from CiNii)

    Articles in CiNii:1

    • 31p-TF-1 High Density Implosion of Shell Targets V : Fuel density-radius product (ρR) measurement by measuring the number of protons elastically scattered by 14-MeV fusion neutrons (1989)
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