Search Results1-19 of  19

  • SHIMAZU Nobuo ID: 9000000511684

    NTT LSI Lab., Nippon Telegraph and Telephone Corp. (1994 from CiNii)

    Articles in CiNii:1

    • A Measuring Method for Chucking and Release Time in an Electrostatic Chuck (1994)
  • SHIMAZU Nobuo ID: 9000000677089

    LEEPL Corporation (2002 from CiNii)

    Articles in CiNii:1

    • Development of the next-generation electron-beam exposure system (2002)
  • SHIMAZU Nobuo ID: 9000002957223

    (株)リープル (2001 from CiNii)

    Articles in CiNii:1

    • Development of Low Energy Electron Beam Proximity Projection Lithography (2001)
  • SHIMAZU Nobuo ID: 9000005565784

    NTT LSI Laboratories (1996 from CiNii)

    Articles in CiNii:4

    • Application of Mark Detection Using the Vibration Method to an Electron Beam Exposure System (1995)
    • Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging (1996)
    • A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2 (1996)
  • SHIMAZU Nobuo ID: 9000005716009

    NTT LSI Laboratories (1994 from CiNii)

    Articles in CiNii:1

    • Proximity Effect Correction for X-Ray Mask Fabrication (1994)
  • SHIMAZU Nobuo ID: 9000020653205

    Articles in CiNii:1

    • High speed electron beam lithography. (1987)
  • SHIMAZU Nobuo ID: 9000022200191

    Articles in CiNii:1

    • Changes in precision engineering. LSI industry. (1990)
  • SHIMAZU Nobuo ID: 9000253328076

    lEEPL Corporation (2002 from CiNii)

    Articles in CiNii:1

    • Development of the next-generation electron-beam exposure system (2002)
  • SHIMAZU Nobuo ID: 9000254282897

    NTT LSI Lab., Nippon Telegraph and Telephone Corp. (1994 from CiNii)

    Articles in CiNii:1

    • A Measuring Method for Chucking and Release Time in an Electrostatic Chuck (1994)
  • Shimazu Nobuo ID: 9000253030474

    R&D Division, LEEPL Corporation (2002 from CiNii)

    Articles in CiNii:1

    • Present Status of Exposure Tool Development for Low Energy Electron-beam Proximity Projection Lithography. (2002)
  • Shimazu Nobuo ID: 9000258120890

    NTT LSI Laboratories, 3–1, Morinosato Wakamiya, Atsugi–shi, Kanagawa 243–01 (1994 from CiNii)

    Articles in CiNii:1

    • Proximity Effect Correction for X-Ray Mask Fabrication. (1994)
  • Shimazu Nobuo ID: 9000258125194

    NTT LSI Laboratories, 3–1 Morinosato Wakamiya, Atsugi–shi, Kanagawa 243–01, Japan (1995 from CiNii)

    Articles in CiNii:1

    • An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System. (1995)
  • Shimazu Nobuo ID: 9000401644900

    Articles in CiNii:1

    • Proximity Effect Correction for X-Ray Mask Fabrication (1994)
  • Shimazu Nobuo ID: 9000401652205

    Articles in CiNii:1

    • Application of Mark Detection Using the Vibration Method to an Electron Beam Exposure System (1995)
  • Shimazu Nobuo ID: 9000401652345

    Articles in CiNii:1

    • An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System (1995)
  • Shimazu Nobuo ID: 9000401657738

    Articles in CiNii:1

    • Basic Characteristics of Beam Position Drift and Field Stitching Error Caused by Electron Beam Column Charging (1996)
  • Shimazu Nobuo ID: 9000401659748

    Articles in CiNii:1

    • A Beam Drift Reduction Device for the X-Ray Mask E-Beam Writer, EB-X2 (1996)
  • Shimazu Nobuo ID: 9000401659751

    Articles in CiNii:1

    • A 100 kV Electron Gun for the X-Ray Mask Writer, EB-X2 (1996)
  • Shimazu Nobuo ID: 9000401994147

    Articles in CiNii:1

    • An Approach to a High-Throughput E-Beam Writer with a Single-Gun Multiple-Path System (1995)
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