Search Results1-20 of  98

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  • Sasago Masaru ID: 9000009565051

    Articles in CiNii:1

    • Photochemical Reaction of Polymers Used as Resists by 146-nm Light Exposure (1999)
  • Sasago Masaru ID: 9000009661469

    Articles in CiNii:1

    • Dissolution Characteristics of Acidic Groups for 157-nm Resist (2002)
  • Sasago Masaru ID: 9000025083252

    Articles in CiNii:1

    • Fundamental study of the mask topography effect on the advanced phase-shifting masks for next-generation lithography (Special issue: Microprocesses and nanotechnology) (2010)
  • SASAGO MASARU ID: 9000253031093

    Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd. (1991 from CiNii)

    Articles in CiNii:1

    • KrF excimer laser lithography technology for 64M DRAM. (1991)
  • SASAGO Masaru ID: 9000000079128

    ULSI Process Technology Development Center, Matsushita Electronics Corporation (1999 from CiNii)

    Articles in CiNii:2

    • VUV Lithography (1999)
    • Prospects of semiconductor technology and lithography (1999)
  • SASAGO Masaru ID: 9000000351735

    Matsushita Semiconductor Company (2000 from CiNii)

    Articles in CiNii:1

    • Laser Lithography for Semiconductor Roadmap (2000)
  • SASAGO Masaru ID: 9000002959888

    ULSI Process Technology Development Center, Semiconductor Company, Matsushita Electric Industrial Co., Ltd. (2005 from CiNii)

    Articles in CiNii:11

    • Prospects of semiconductor lithography (2004)
    • Top Surface Imaging (TSI) Resist Process (1998)
    • KrFエキシマレ-ザリソグラフィ対応化学増幅型レジスト (材料技術<特集>) -- (有機・高分子材料) (1994)
  • SASAGO Masaru ID: 9000004965862

    技術研究組合超先端電子技術開発機構 (1998 from CiNii)

    Articles in CiNii:7

    • 半導体集積回路分野 (1998)
    • Micro-Processing by ArF Excimer Laser (1998)
    • Update and Issues of ArF Excimer Laser Lithography (1997)
  • SASAGO Masaru ID: 9000005903161

    Yokohama Research Center, Association of Super-Advanced Electronics Technologies:(Present address)ULSI Process Technology Development Center, Matsushima Electronics Co. (2000 from CiNii)

    Articles in CiNii:1

    • Contrast Enhancement based on Acid Equilibrium for Chemically Amplified Resists (2000)
  • SASAGO Masaru ID: 9000107349980

    Matsushita Electric Industrial Co. (2004 from CiNii)

    Articles in CiNii:1

    • Bilayer Resist Method for Room-Temperature Nanoimprint Lithography (2004)
  • SASAGO Masaru ID: 9000107386563

    Matsushita Electric Industrial Co., Ltd. (Panasonic) (2006 from CiNii)

    Articles in CiNii:1

    • "Mask Enhancer" Technology on ArF Immersion Tool for 45-nm-Node Complementary Metal Oxide Semiconductor with 0.249μm^2 Static Random Access Memory Contact Layer Fabrication (2006)
  • SASAGO Masaru ID: 9000252845023

    Semiconductor Research Center, Matsushita Electric Ind., Co. Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • Fabrication of Fine Patterns Using Water-Soluble Photopolymer (1987)
  • SASAGO Masaru ID: 9000253324068

    Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd. (1987 from CiNii)

    Articles in CiNii:1

    • Submicron Lithography Using Excimer Laser (1987)
  • SASAGO Masaru ID: 9000253324452

    Semiconductor Research Center, Matsushita Electric Ind., Co. Ltd. (1989 from CiNii)

    Articles in CiNii:1

    • Excimer Laser Lithography Technology (1989)
  • SASAGO Masaru ID: 9000253327245

    Semiconductor Group, ULSI Process Technology Development Center, Matsushita Electronics Corporation (1999 from CiNii)

    Articles in CiNii:1

    • Prospects of semiconductor technology and lithography (1999)
  • SASAGO Masaru ID: 9000253689998

    Semiconductor Research Center Matsushita Electric Ind. Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Excimer laser lithography. (1988)
  • SASAGO Masaru ID: 9000254398340

    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • A deep UV contrast enhanced material using 5-diazo-Meldrum's acid. (1988)
  • SASAGO Masaru ID: 9000254932027

    Semiconductor Research Center, Matsushita Electric Industrial Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Effect of deep UV irradiation on a positive photoresist and its aplication to microlithography. (1988)
  • SASAGO Masaru ID: 9000254932058

    Semiconductor Research Center, Matsushita Electric Ind. Co., Ltd. (1988 from CiNii)

    Articles in CiNii:1

    • Characteristics of water-soluble contrast enhanced materials. (1988)
  • SASAGO Masaru ID: 9000363159093

    Articles in CiNii:1

    • Application of Photobleachable Positive Resist and contrast Enhancement Material to KrF Excimer Laser Lithography : Resist Material and Process : (1989)
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