Search Results81-98 of  98

  • 5 / 5
  • Sasago Masaru ID: 9000401667933

    Articles in CiNii:1

    • 1997-12-30 (1997)
  • Sasago Masaru ID: 9000401667943

    Articles in CiNii:1

    • 1997-12-30 (1997)
  • Sasago Masaru ID: 9000401674910

    Articles in CiNii:1

    • Theoretical Calculations of Sensitivity of Deprotection Reactions for Acrylic Polymers for 193 nm Lithography II: Protection Groups Containing an Adamantyl Unit (1998)
  • Sasago Masaru ID: 9000401675332

    Articles in CiNii:1

    • Nonhomogeneous Pattern Formation in the Dissolution Processes of Novolak-Diazonaphthoquinone Resists (1998)
  • Sasago Masaru ID: 9000401675711

    Articles in CiNii:1

    • 1998-12-30 (1998)
  • Sasago Masaru ID: 9000401675715

    Articles in CiNii:1

    • Study of the Bottom Antireflective Coating Process Using a High-Transparency Resist for ArF Excimer Laser Lithography (1998)
  • Sasago Masaru ID: 9000401675723

    Articles in CiNii:1

    • 1998-12-30 (1998)
  • Sasago Masaru ID: 9000401680638

    Articles in CiNii:1

    • Atomic Force Microscopy Study on the Dissolution Processes of Chemically Amplified Resists for KrF Excimer Laser Lithography (1999)
  • Sasago Masaru ID: 9000401680642

    Articles in CiNii:1

    • Approach to Next-Generation Optical Lithography (1999)
  • Sasago Masaru ID: 9000401681594

    Articles in CiNii:1

    • Dissolution Rate Analysis of ArF Resists Based on the Percolation Model (1999)
  • Sasago Masaru ID: 9000401684524

    Articles in CiNii:1

    • Aberration Tolerance for 130 nm Lithography from Viewpoint of Process Latitude (1999)
  • Sasago Masaru ID: 9000401684621

    Articles in CiNii:1

    • Design Concepts of Single-Layer Resists for Vacuum Ultraviolet Lithography (1999)
  • Sasago Masaru ID: 9000401688131

    Articles in CiNii:1

    • Contrast Enhancement based on Acid Equilibrium for Chemically Amplified Resists (2000)
  • Sasago Masaru ID: 9000401707721

    Articles in CiNii:1

    • Measurement of Resist Transmittance at Extreme Ultraviolet Wavelength Using the Extreme Ultraviolet Reflectometer (2002)
  • Sasago Masaru ID: 9000401709719

    Articles in CiNii:1

    • Study of Transmittance of Polymers and Influence of Photoacid Generator on Resist Transmittance at Extreme Ultraviolet Wavelength (2002)
  • Sasago Masaru ID: 9000401727200

    Articles in CiNii:1

    • Bilayer Resist Method for Room-Temperature Nanoimprint Lithography (2004)
  • Sasago Masaru ID: 9000401750446

    Articles in CiNii:1

    • 2006-06-20 (2006)
  • Sasago Masaru ID: 9000401788709

    Articles in CiNii:1

    • Fundamental Study of the Mask Topography Effect on the Advanced Phase-Shifting Masks for Next-Generation Lithography (2010)
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