Search Results1-20 of  83

  • 1 / 5
  • Shirafuji Tatsuru ID: 9000375923204

    Articles in CiNii:4

    • Acquisition of cell-adhesion capability of the surface of crosslinked albumin films irradiated with atmospheric-pressure plasma jets (2016)
    • Reaction mechanisms of methylene-blue degradation in three-dimensionally integrated micro-solution plasma (2017)
    • Effects of ambient air on the characteristics of an atmospheric-pressure plasma jet of a gas mixture of highly N_2-diluted O_2 on a sliding substrate (2017)
  • Shirafuji Tatsuru ID: 9000375923204

    Articles in CiNii:4

    • Acquisition of cell-adhesion capability of the surface of crosslinked albumin films irradiated with atmospheric-pressure plasma jets (2016)
    • Reaction mechanisms of methylene-blue degradation in three-dimensionally integrated micro-solution plasma (2017)
    • Effects of ambient air on the characteristics of an atmospheric-pressure plasma jet of a gas mixture of highly N_2-diluted O_2 on a sliding substrate (2017)
  • Shirafuji Tatsuru ID: 9000404159122

    Articles in CiNii:1

    • The Dependence of Nonlinear Electrical Properties of Yeast Suspensions on Temperature and Electrode Shape (2019)
  • SHIRAFUJI Tatsuru ID: 9000404508654

    International Innovation Center, Kyoto University (2006 from CiNii)

    Articles in CiNii:1

    • Preparation of thermally stable low-<i>k</i> thin films using C<sub>6</sub>F<sub>6</sub> plasma:−Gas phase diagnostics and characterization of film structure− (2006)
  • Shirafuji Tatsuru ID: 9000018552285

    Articles in CiNii:1

    • Fabrication of transparent protective diamond-like carbon films on polymer (Special issue: Plasma processing) (2011)
  • Shirafuji Tatsuru ID: 9000024939496

    Articles in CiNii:1

    • Oxygen gas barrier properties of hydrogenated amorphous carbon thin films deposited with a pulse-biased inductively coupled plasma chemical vapor deposition method (Special issue: Dry process) (2010)
  • Shirafuji Tatsuru ID: 9000241877358

    Articles in CiNii:1

    • Generation of Three-Dimensionally Integrated Micro-Solution Plasma and Its Application to Decomposition of Methylene Blue Molecules in Water (Special Issue : Advanced Plasma Science and Its Applications for Nitrides and Nanomaterials) (2013)
  • Shirafuji Tatsuru ID: 9000242139172

    Articles in CiNii:1

    • Gold Nanoparticle Synthesis Using Three-Dimensionally Integrated Micro-Solution Plasmas (2013)
  • Shirafuji Tatsuru ID: 9000242139305

    Articles in CiNii:1

    • Functionalization of Multiwalled Carbon Nanotubes by Solution Plasma Processing in Ammonia Aqueous Solution and Preparation of Composite Material with Polyamide 6 (2013)
  • SHIRAFUJI Tatsuru ID: 9000001238317

    International Innovation Center, Kyoto University (2004 from CiNii)

    Articles in CiNii:1

    • Plasma Copolymerization of C_6F_6/C_5F_8 for Application of Low-Dielectric-Constant Fluorinated Amorphous Carbon Films and Its Gas-Phase Diagnostics Using In Situ Fourier Transform Infrared Spectroscopy (2004)
  • SHIRAFUJI Tatsuru ID: 9000002165844

    Department of Electronics and Information Science, Kyoto Institute of Technology (1999 from CiNii)

    Articles in CiNii:1

    • PE-CVD of Thermally Stable Low-k IMD Films Using Low-GWPC_5F_8 (1999)
  • SHIRAFUJI Tatsuru ID: 9000004965891

    Kyoto University (2008 from CiNii)

    Articles in CiNii:12

    • Plasma Enhanced Chemical Vapor Deposition of Interlayer Films Having a Low Dielectric Constant (2000)
    • Gas chemistry, film properties and global warming problems on fluorocarbon plasma chemical vapor deposition (1999)
    • Low-Temperature Growth Process of Polycrystalline Silicon for Thin Film Transistors (1994)
  • SHIRAFUJI Tatsuru ID: 9000005542442

    International innovation Center, Kyoto University (2002 from CiNii)

    Articles in CiNii:6

    • Measurement and Calculation of SiH_2 Radical Density in SiH_4 and Si_2H_6 Plasma for the Deposition of Hydrogenated Amorphous Silicon Thin Films (1995)
    • Thickness Dependence of H Radical Treatment of Si Thin Films Deposited by Plasma-Enhanced Chemical Vapor Deposition Using SiF_4/SiH_4/H_2 Gases (1996)
    • Construction and Performance of a Fourier-Transform Infrared Phase-Modulated Ellipsometer for In-Process Surface Diagnostics (1996)
  • SHIRAFUJI Tatsuru ID: 9000005563200

    Department of Electronics and Information Science, Kyoto Institute of Technology (1994 from CiNii)

    Articles in CiNii:1

    • In Situ Ellipsometric Monitoring of the Growth of Polycrystalline Silicon Thin Films by RF Plasma Chemical Vapor Deposition (<Special Issue> Plasma Processing) (1994)
  • SHIRAFUJI Tatsuru ID: 9000006401575

    京都大学国際融合創造センター (2007 from CiNii)

    Articles in CiNii:3

    • 平成18年度 日本真空協会関西支部第1回講演会 (2006)
    • Preparation of thermally stable low-k thin films using C_6F_6 plasma : Gas phase diagnostics and characterization of film structure (2006)
    • Preparation of Low-Dielectric-Constant Films Using Fluorocarbon Plasma CVD Methods (2007)
  • SHIRAFUJI Tatsuru ID: 9000017329232

    名古屋大学大学院工学研究科 (2010 from CiNii)

    Articles in CiNii:3

    • Solution Plasma Surface Modification for Nanocarbon-Composite Materials (2009)
    • Systems and Their Characteristics for Plasma Source in Plasma Antisepsis (2010)
    • Synthesis of nanoparticles and surface functionalization using solution plasma (2010)
  • SHIRAFUJI Tatsuru ID: 9000018771523

    Osaka City University (2011 from CiNii)

    Articles in CiNii:1

    • On The Possibility of Non-invasive Plasma Sterilization Using Er:YAG Laser (2011)
  • SHIRAFUJI Tatsuru ID: 9000019053509

    Dept. Physical Electronics and Informatics, Osaka City University (2011 from CiNii)

    Articles in CiNii:1

    • Chemical Reaction Engineering of Plasma CVD (2011)
  • SHIRAFUJI Tatsuru ID: 9000107355700

    Department of Electronics and Information Science, Kyoto Institute of Technology (1997 from CiNii)

    Articles in CiNii:1

    • Preparation of Stable F-Doped SiO_2 Thin Films from Si(NCO)_4/SiF_4/O_2 Gas Mixtures Using a Conventional Capacitively Coupled RF Plasma Source (1997)
  • SHIRAFUJI Tatsuru ID: 9000107377903

    International Innovation Center, Kyoto University (2003 from CiNii)

    Articles in CiNii:1

    • Plasma Enhanced Chemical Vapor Deposition of Fluorinated Amorphous Carbon Films on the Surface with Reverse Tapered Microstructures (2003)
  • 1 / 5
Page Top