Search Results1-20 of  106

  • Shirai Masamitsu ID: 9000009563205

    Articles in CiNii:1

    • Photo-Induced Insolubilization of Copolymers Bearing β-Keto Sulfone Groups in the Presence of Amines (1999)
  • Shirai Masamitsu ID: 9000009563839

    Articles in CiNii:1

    • Ablation of Poly(methyacrylates)Film Using 185-nm Light (1997)
  • Shirai Masamitsu ID: 9000009563871

    Articles in CiNii:1

    • Photo-thermal Insolubilization of Polymers Bearing Imino Sulfonate Units (1997)
  • Shirai Masamitsu ID: 9000009564110

    Articles in CiNii:1

    • ArF Surface Modification Resist Process Using Polymer System with Polarity Change Unit (1997)
  • Shirai Masamitsu ID: 9000009564325

    Articles in CiNii:1

    • Chemical Modification of Polymer Surface Using 185-nm Light (1996)
  • Shirai Masamitsu ID: 9000009565011

    Articles in CiNii:1

    • Sulfonic Acid Ester Unit-containing Polymers for Surface Modification Resist (1998)
  • Shirai Masamitsu ID: 9000009565172

    Articles in CiNii:1

    • Initiator-Free Visible Light Curing of Quinone Derivative/Vinyl Ether System (2000)
  • Shirai Masamitsu ID: 9000009565407

    Articles in CiNii:1

    • Poly(α-methyl-p-hydoroxystyrene-co-methacrylonitrile) Based Single-Layer Resists for VUV Lithography (1) Synthesis, Properties and Photochemistry (2000)
  • Shirai Masamitsu ID: 9000009565628

    Articles in CiNii:1

    • Effective Utilization of 366 nm-Light in Photo-Generation of Pendant Amino Groups Using Pendant Thioxanthone Groups (2000)
  • Shirai Masamitsu ID: 9000009565742

    Articles in CiNii:1

    • Curing Systems Using Photolysis of Carbamoyloxyimino Groups and Thermally Regenerated Isocyanate Groups (2001)
  • Shirai Masamitsu ID: 9000009566087

    Articles in CiNii:1

    • 157nm Single-Layer and Bilayer Resists Based on α-Methylstyrene Polymers (2001)
  • Shirai Masamitsu ID: 9000009566155

    Articles in CiNii:1

    • 146-nm Light Induced Crosslinking of Poly(vinylphenol) and Its Silylation (2001)
  • Shirai Masamitsu ID: 9000009872143

    Articles in CiNii:1

    • I-Line Sensitive Photoacid Generators Having Thianthrene Skeleton (2004)
  • Shirai Masamitsu ID: 9000009872458

    Articles in CiNii:1

    • Acid Components in Outgassing from F2 Resists: A Study Using In-Situ QCM Technique (2004)
  • Shirai Masamitsu ID: 9000010003855

    Articles in CiNii:1

    • Themally Stable Carbamates as Novel Photobase Generator (2005)
  • Shirai Masamitsu ID: 9000010004042

    Articles in CiNii:1

    • Synthesis and Dissolution Properties of ArF Resist with Well-defined Structure (2005)
  • Shirai Masamitsu ID: 9000010100019

    Articles in CiNii:1

    • Synthesis of Photocrosslinkable Polymers Having Pendant Oxetane Groups and Their Dissolution in Water by Thermolysis (2005)
  • Shirai Masamitsu ID: 9000010177503

    Articles in CiNii:1

    • Quaternary Ammonium Salt as DBU-Generating Photobase Generator (2006)
  • Shirai Masamitsu ID: 9000010263873

    Articles in CiNii:1

    • Design and Characteristics of Acrylate Polymers with Alicyclic Lactone Group for ArF resists (2006)
  • Shirai Masamitsu ID: 9000010400633

    Articles in CiNii:1

    • Non-ionic photoacid generators sensitive to 365nm light: synthesis and applications to photocrosslinking systems (2007)
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