Search Results1-7 of  7

  • SOUMAGNE Georg ID: 9000002304748

    Dept.of Electronic Devices Eng.,Graduate School of Information Science and Electrical Eng.,Kyushu Univ. (1996 from CiNii)

    Articles in CiNii:1

    • Surface Mordification of Laser-Ablated BaTiO__3 (1996)
  • SOUMAGNE Georg ID: 9000019007380

    EUVA (Extreme Ultraviolet Lithography System Development Association) Hiratsuka R&D Center (2007 from CiNii)

    Articles in CiNii:3

    • Characteristics of Debris from a CO_2 Laser-Produced Plasma Using a Solid Tin Target for Development of Extreme Ultraviolet Source (2007)
    • Development of Laser Produced Plasma EUV Light source for Lithography (2007)
    • 02aB22P Fast ion mitigation for a Xe target laser produced plasma EUV source (2005)
  • SOUMAGNE Georg ID: 9000107349782

    Hiratsuka Research and Development Center, Extreme Ultraviolet Lithography System Development Association (EUVA) (2004 from CiNii)

    Articles in CiNii:1

    • Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography (2004)
  • SOUMAGNE Georg ID: 9000237722907

    Articles in CiNii:2

    • Laser Spectroscopic Diagnostics of Laser-Ablation Processes Used for Thin Film Deposition (1996)
    • Laser Spectroscopic Diagnostics of Laser-Ablation Processes Used for Thin Film Deposition (1996)
  • SOUMAGNE Georg ID: 9000257902719

    EUVA (Extreme Ultraviolet Lithography System Development Association) Hiratsuka R & D Center (2007 from CiNii)

    Articles in CiNii:1

    • Characteristics of Debris from a CO<SUB>2</SUB> Laser-Produced Plasma Using a Solid Tin Target for Development of Extreme Ultraviolet Source (2007)
  • Soumagne Georg ID: 9000258174043

    Hiratsuka Research and Development Center, Extreme Ultraviolet Lithography System Development Association (EUVA) (2004 from CiNii)

    Articles in CiNii:1

    • Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography (2004)
  • Soumagne Georg ID: 9000401726783

    Articles in CiNii:1

    • Laser-Produced Plasma Light Source Development for Extreme Ultraviolet Lithography (2004)
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