Search Results1-19 of  19

  • SUGIHARA Kohei ID: 9000000802817

    Department of Chemistry, Graduate School of Science, Kyoto University (1997 from CiNii)

    Articles in CiNii:1

    • Study on the Photolysis Quantum Yield of Diphenyl Disulfide by the Transient Grating Method (1997)
  • SUGIHARA Kohei ID: 9000004781262

    Articles in CiNii:11

    • Excellent Si epitaxial layer formation for deep sub-micron MOSFETs with elevated source/drain structures by UHV-CVD (1998)
    • Novel Locally Strained Channel Technique for High Performance 55nm CMOS (2003)
    • Long-haul and large capacity optical transmission systems (2010)
  • SUGIHARA Kohei ID: 9000014189031

    Advanced Technology R&D Center, Mitsubishi Electric Corporation (2008 from CiNii)

    Articles in CiNii:1

    • Planar Avalanche Photodiode for Long-Haul Single-Photon Optic Fiber Communications (2008)
  • SUGIHARA Kohei ID: 9000107305905

    Advanced Technology R&D Center, Mitsubishi Electric Corporation (2003 from CiNii)

    Articles in CiNii:1

    • Improvement of Surface Morphology of Epitaxial Silicon Film for Elevated Source/Drain Ultrathin Silicon-on-Insulator Complementary-Metal-Oxide-Semiconductor Devices (2003)
  • SUGIHARA Kohei ID: 9000107334232

    Advanced Technology R&D Center, Mitsubishi Electric Corporation (2001 from CiNii)

    Articles in CiNii:1

    • A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations (2001)
  • SUGIHARA Kohei ID: 9000257977172

    Course of Electro Photo Optics, Graduate School of Engineering, Tokai University (2013 from CiNii)

    Articles in CiNii:1

    • Sulfide Solutions as Inkjet Inks for Color-changeable Ag Films (2013)
  • SUGIHARA Kohei ID: 9000283252166

    Course of Electro Photo Optics, Graduate School of Engineering, Tokai University (2013 from CiNii)

    Articles in CiNii:1

    • Mechanism for the Color Change of Ag Films with Sulfide Solutions (2013)
  • Sugihara Kohei ID: 9000252765221

    Department of Physics, College of General Education, Osaka University (1992 from CiNii)

    Articles in CiNii:1

    • Microwave Studies of Electron Scattering by Isolated Interstitial Oxygen and Oxygen Complex in Silicon (1992)
  • Sugihara Kohei ID: 9000256015753

    Department of Chemistry, Graduate School of Science, Kyoto University (1997 from CiNii)

    Articles in CiNii:1

    • Study on the Photolysis Quantum Yield of Diphenyl Disulfide by the Transient Grating Method. (1997)
  • Sugihara Kohei ID: 9000258150133

    Advanced Technology R&D Center, Mitsubishi Electric Corporation, 4-1, Mizuhara, Itami, Hyogo 664-8641, Japan (2000 from CiNii)

    Articles in CiNii:1

    • Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies. (2000)
  • Sugihara Kohei ID: 9000258166268

    Advanced Technology R&D Center, Mitsubishi Electric Corporation (2003 from CiNii)

    Articles in CiNii:1

    • Improvement of Surface Morphology of Epitaxial Silicon Film for Elevated Source/Drain Ultrathin Silicon-on-Insulator Complementary-Metal-Oxide-Semiconductor Devices (2003)
  • Sugihara Kohei ID: 9000365542899

    Departments of Clinical Nutrition and Food Management, Institute of Biomedical Sciences, Tokushima University Graduate School (2017 from CiNii)

    Articles in CiNii:1

    • Dietary phosphate exacerbates intestinal inflammation in experimental colitis (2017)
  • Sugihara Kohei ID: 9000392730268

    Articles in CiNii:1

    • Microwave Studies of Electron Scattering by Isolated Interstitial Oxygen and Oxygen Complex in Silicon (1992)
  • Sugihara Kohei ID: 9000401563928

    Articles in CiNii:1

    • Planar Avalanche Photodiode for Long-Haul Single-Photon Optic Fiber Communications (2007)
  • Sugihara Kohei ID: 9000401630737

    Articles in CiNii:1

    • Microwave Studies of Electron Scattering by Isolated Interstitial Oxygen and Oxygen Complex in Silicon (1992)
  • Sugihara Kohei ID: 9000401686096

    Articles in CiNii:1

    • Advantage of Shallow Trench Isolation over Local Oxidation of Silicon on Alignment Tolerance (1999)
  • Sugihara Kohei ID: 9000401690066

    Articles in CiNii:1

    • Parasitic Resistance Reduction in Deep Submicron Dual-Gate Transistors with Partially Elevated Source/Drain Extension Regions Fabricated by Complementary Metal-Oxide-Semiconductor Technologies (2000)
  • Sugihara Kohei ID: 9000401697824

    Articles in CiNii:1

    • A Dual-Gate Complementary Metal-Oxide-Semiconductor Technology with Novel Self-Aligned Pocket Implantation which Takes Advantage of Elevated Source/Drain Configurations (2001)
  • Sugihara Kohei ID: 9000401714972

    Articles in CiNii:1

    • Improvement of Surface Morphology of Epitaxial Silicon Film for Elevated Source/Drain Ultrathin Silicon-on-Insulator Complementary-Metal-Oxide-Semiconductor Devices (2003)
Page Top