Search Results1-20 of  314

  • TAGAWA Seiichi ID: 9000404111543

    大阪大学産業科学研究所 (2011 from CiNii)

    Articles in CiNii:1

    • Electron Linac Facility of University of Tokyo (2011)
  • Tagawa Seiichi ID: 9000009564877

    Articles in CiNii:1

    • Laser Flash Photolysis Studies on Chemically Amplified Resists(1)Femtosecond Laser Flash Photolysis of Diphenyliodonium Salts (1998)
  • Tagawa Seiichi ID: 9000009746566

    Articles in CiNii:1

    • Effect of Poly(vinyl alcohol) on Radiation-induced Acid-generation of Diphenyliodonium Salt (2003)
  • Tagawa Seiichi ID: 9000010553274

    Articles in CiNii:1

    • Impact of nonconstant diffusion coefficient on latent image quality in 22nm fabrication using extreme ultraviolet lithography (2008)
  • Tagawa Seiichi ID: 9000010734457

    Articles in CiNii:1

    • Image formation in chemically amplified resists upon exposure to extreme ultraviolet radiation (2009)
  • Tagawa Seiichi ID: 9000018623387

    Articles in CiNii:1

    • Determination of optimum thermalization distance based on trade-off relationship between resolution, line edge roughness and sensitivity of chemically amplified extreme ultraviolet resists (2011)
  • Tagawa Seiichi ID: 9000018623411

    Articles in CiNii:1

    • Theoretical study on reactivity of photoacid generators for EUV lithography (2011)
  • Tagawa Seiichi ID: 9000018953951

    Articles in CiNii:1

    • Hemispherical Confocal Imaging (Computer Vision and Application Vol.3) (2012)
  • Tagawa Seiichi ID: 9000024971361

    Articles in CiNii:1

    • Theoretical study of exposure latitude of chemically amplified resists used for extreme ultraviolet lithography (2011)
  • Tagawa Seiichi ID: 9000025033161

    Articles in CiNii:1

    • Dependence of absorption coefficient and acid generation efficiency on acid generator concentration in chemically amplified resist for extreme ultraviolet lithography (2007)
  • Tagawa Seiichi ID: 9000025041718

    Articles in CiNii:1

    • Theoretical study of photoacid generators for extreme ultraviolet resist (Special issue: Microprocesses and nanotechnology) (2011)
  • Tagawa Seiichi ID: 9000025042109

    Articles in CiNii:1

    • Single-component chemically amplified resist based on dehalogenation of polymer (2007)
  • Tagawa Seiichi ID: 9000025083626

    Articles in CiNii:1

    • Relationship between normalized image log slope and chemical gradient in chemically amplified extreme ultraviolet resists (Special issue: Microprocesses and nanotechnology) (2010)
  • Tagawa Seiichi ID: 9000025116468

    Articles in CiNii:1

    • Theoretical study on relationship between acid generation efficiency and acid generator concentration in chemically amplified extreme ultraviolet resists (2007)
  • Tagawa Seiichi ID: 9000025116480

    Articles in CiNii:1

    • Point spread function for the calculation of acid distribution in chemically amplified resists used for electron-beam lithography (2007)
  • Tagawa Seiichi ID: 9000241566364

    Articles in CiNii:1

    • Study of Interrelation Between Reaction of Polymer-Bound/Blend Photoacid Generator with Solvated Electron and Acid Generation Efficiency (Special Issue : Microprocesses and Nanotechnology) (2013)
  • TAGAWA SEIICHI ID: 9000001301476

    Department of Beam Materials Science, The Institute of Scientific and Industrial Research, Osaka University (2003 from CiNii)

    Articles in CiNii:1

    • Nonisothermal Crystallization Kinetics of Biodegradable Random Poly(3-hydroxybutyrate-co-3-hydroxyvalerate) and Block One (2003)
  • TAGAWA SEIICHI ID: 9000252776691

    Research Center for Nuclear Science and Technology, University of Tokyo (1991 from CiNii)

    Articles in CiNii:1

    • Radiation induced reactions of polyethylene model compounds. (1991)
  • TAGAWA SEIICHI ID: 9000252776693

    Research Center for Nuclear Science and Technology, University of Tokyo (1991 from CiNii)

    Articles in CiNii:1

    • Radiation effects of high energy ion beams on polystyrene. Emission spectra.:EMISSION SPECTRA (1991)
  • TAGAWA SEIICHI ID: 9000253032586

    The Institute of Scientific and Industrial Research, Osaka University (1996 from CiNii)

    Articles in CiNii:1

    • Transient Species Induced in X-ray Chemically Amplified Positive Resists: Post-Exposure Delay Effect.:POST-EXPOSURE DELAY EFFECT (1996)
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