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  • TAKANO Hirozou ID: 9000005569816

    Optoelectronic & Microwave Devices Laboratory, Mitsubishi Electric Corp. (1995 from CiNii)

    Articles in CiNii:1

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method (1995)
  • Takano Hirozou ID: 9000004778924

    Mitsubishi Electric Corp. Optoelectronic and Microwave Devices Lab. (1995 from CiNii)

    Articles in CiNii:5

    • Highly selective etching of GaAs/AlGaAs hetero structures with citric acid-based etchats. (1993)
    • A WSi/W self-aligned gate FET for high power amplifier with low voltage supply (1994)
    • Drain Current Frequency Dispersion in GaAs Self-Aligned Gate FET (1995)
  • Takano Hirozou ID: 9000258129676

    Optoelectronic & Microwave Devices Laboratory, Mitsubishi Electric Corp., 4–1 Mizuhara, Itami, Hyogo 664, Japan (1995 from CiNii)

    Articles in CiNii:1

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method. (1995)
  • Takano Hirozou ID: 9000284278600

    Articles in CiNii:1

    • Alloyed and Non-Alloyed Ohmic Contacts for AlInAs/InGaAs High Electron Mobility Transistors. (1994)
  • Takano Hirozou ID: 9000401641812

    Articles in CiNii:1

    • Alloyed and Non-Alloyed Ohmic Contacts for AlInAs/InGaAs High Electron Mobility Transistors (1994)
  • Takano Hirozou ID: 9000401650965

    Articles in CiNii:1

    • Effect of Lens Aberration on Resist Pattern Profiles in Edge-Line Phase-Shift Method (1995)
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