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  • TOBE Ryoki ID: 9000000007696

    Articles in CiNii:3

    • Growth and Properties of Titanium Nitride and Titanium Films by Chemical-Vapor-Deposition using High Density Plasma (1995)
    • Effects of NH3 addition on improving step coverage of MOCVD-TiN films using TDEAT (1999)
    • Conformal MOCVD-TiN Films Deposited from TDEAT and Ammonia (2001)
  • TOBE Ryoki ID: 9000000615943

    ANELVA CORPORATION (2001 from CiNii)

    Articles in CiNii:1

    • Monte Carlo Simulation of TiN-Metalorganic Chemical Vapor Deposition Including a Surface Reaction (2001)
  • TOBE Ryoki ID: 9000020105353

    ANELVA CORPORATION (2001 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (2001)
  • TOBE Ryoki ID: 9000021466108

    R&D div., Anelva corp. (1995 from CiNii)

    Articles in CiNii:1

    • サマリー・アブストラクト (1995)
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