Search Results1-20 of  34

  • 1 / 2
  • TOJO Toru ID: 9000002034250

    Corporate R&D Center, General Engineering and Quality Assurance Division, Topcon Corporation (2009 from CiNii)

    Articles in CiNii:2

    • A New Algorithm for Die-to-Wafer-like Image Mask Inspection in Real Time (2007)
    • Optimum Optics for Die-to-Wafer-like Image Mask Inspection (2009)
  • TOJO Toru ID: 9000002885897

    株式会社東芝研究開発センターLSI基盤技術ラボラトリー研究 (2001 from CiNii)

    Articles in CiNii:5

    • 超LSI用フォトマスク製作を実現したEB描画装置・欠陥検査装置 (特集 先端半導体デバイス技術) (1999)
    • 直線翼列内の流れとその流線追跡について-2- (1976)
    • Development of the High Precision Work-stage for Electron Beam Exposure System (1981)
  • TOJO Toru ID: 9000002957105

    ULSI Research Laboratory,Research and Development Center,Toshiba (1994 from CiNii)

    Articles in CiNii:3

    • Piezoelectricdriven XYθ Table (1986)
    • Expectations from Precision Engineering by Industrial Enterprises (1992)
    • Development of mask inspection system MC-100 (1994)
  • TOJO Toru ID: 9000004965858

    東芝機械(株) (1997 from CiNii)

    Articles in CiNii:2

    • 光ヘテロダイン法を用いた電子ビーム描画装置用精密位置測定法(XYZセンサ)の開発 (1997)
    • The Effect of Down-Flow Cleaning Process on Materials Used in an EB System (1997)
  • TOJO Toru ID: 9000005551466

    Advanced LSI Laboratory, Corporate R&D Center, Toshiba Corporation (2002 from CiNii)

    Articles in CiNii:5

    • A chromatic Aberration-Free Heterodyne Alignment for Optical Lithography : Lithography Technology : (1991)
    • Proximity Effect Correction For Electron Beam Lithography:Highly Accurate Correction Method (1997)
    • The Effect of Down-Flow Cleaning Process on Materials Used in an Electron Beam System (1997)
  • TOJO Toru ID: 9000005716194

    ULSI Research Laboratory, Research and Development Center, Toshiba Corp., (1994 from CiNii)

    Articles in CiNii:1

    • Mask Defect Inspection Method by Database Comparison with 0.25 -0.35 μm Sensitivity (1994)
  • TOJO Toru ID: 9000005945095

    Depertment of Industrial Design, Chiba Institute of Technology (2000 from CiNii)

    Articles in CiNii:6

    • A study on efficient space use of college facillity through Free Addess layout : Phase 1 : Research and design theme for realization of the flexible workspace (1999)
    • A study on efficient space use of college facillity through Free Addess layout : Phase 2 : Pre-survey and evaluation of student work space (1999)
    • A study on efficient space use of college facillity through Free Addess layout : Phase 3 : Post-Occupancy Evaluation of Flexible Workspace (1999)
  • TOJO Toru ID: 9000020652605

    Articles in CiNii:1

    • Special issue on nanotechnology organization - Philosophy and trends. Current aspects and future trends of nanometer positioning. (1990)
  • TOJO Toru ID: 9000020654693

    Articles in CiNii:1

    • Piezoelectric-driven Turntable with High Positioning Accuracy (1st Report):Operation Principle and Basic Performance (1987)
  • TOJO Toru ID: 9000020675626

    Articles in CiNii:1

    • Piezoelectric-driven Turntable with High Positioning Accuracy (2nd Report):Reliability of Piezoelectric-driven Turntable (1989)
  • TOJO Toru ID: 9000020743100

    Articles in CiNii:1

    • The Estimation and Improvement of TTL Alignment Error Budgets for an Excimer Laser Aligner. (1993)
  • TOJO Toru ID: 9000020779482

    Articles in CiNii:1

    • Double diffraction grating alignment method using checker grating. (1st report). Alignment accuracy evaluation.:Alignment Accuracy Evaluation (1989)
  • TOJO Toru ID: 9000022197892

    Articles in CiNii:1

    • TTL Alignment for Excimer Laser Aligner. Real-Time SMART with Correcting Lateral Chromatic Aberration.:Real-Time SMART with Correcting Lateral Chromatic Aberration (1993)
  • TOJO Toru ID: 9000022201410

    Articles in CiNii:1

    • A New TTL Alignment Method for Optical Lithography System. Chromatic Aberration-Free TTL Alignment Technique Using Two Incident Beams.:Chromatic Aberration-Free TTL Alignment Technique Using Two Incident Beams (1992)
  • TOJO Toru ID: 9000107311522

    Advanced Research Laboratory, R&D Center, Toshiba Corporation (2007 from CiNii)

    Articles in CiNii:1

    • High-Accuracy Proximity Effect Correction for Mask Writing (2007)
  • TOJO Toru ID: 9000107350007

    ASET EUV Kawasaki Branch Laboratory (2004 from CiNii)

    Articles in CiNii:1

    • Evaluation of Mask Soaking Performance in a Thermally Stabilized Vacuum Chamber in an Electron Beam Mask Writer (2004)
  • Tojo Toru ID: 9000020798244

    Articles in CiNii:1

    • An Excimer Laser Stepper with Through-the-Lens Alignment. (1993)
  • Tojo Toru ID: 9000252972272

    Research and Development Center, Toshiba Corp. (1990 from CiNii)

    Articles in CiNii:1

    • A Chromatic Aberration-Free Heterodyne Alignment for Optical Lithography (1990)
  • Tojo Toru ID: 9000252981070

    Research and Development Center, Toshiba Corporation (1992 from CiNii)

    Articles in CiNii:1

    • 0.05 μm (3σ) Overlay Accuracy Through-the-lens Alignment in an Excimer Laser Lithography System (1992)
  • Tojo Toru ID: 9000258120877

    ULSI Research Laboratory, Research and Development Center, Toshiba Corp., 1 Komukai, Toshiba–cho, Saiwai–ku, Kawasaki 210 (1994 from CiNii)

    Articles in CiNii:1

    • Mask Defect Inspection Method by Database Comparison with 0.25-0.35 .MU.m Sensitivity. (1994)
  • 1 / 2
Page Top