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  • TOMIOKA Kazuhiro ID: 9000002175695

    Semiconductor Leading Edge Technologies, Inc. (Selete) (2007 from CiNii)

    Articles in CiNii:1

    • Plasma Cure Process for Porous SiOCH Films using CF_4 Gas (2007)
  • TOMIOKA Kazuhiro ID: 9000004864256

    the Multimedia Business Promotion Div.of Japan Telecomm Co., Ltd. (2001 from CiNii)

    Articles in CiNii:1

    • Wireless CATV Uplink System with Subcarrier Modulation Using Infrared Communications for Apartment Houses (2001)
  • TOMIOKA Kazuhiro ID: 9000006955604

    Semiconductor Leading Edge Technologies, Inc. (2009 from CiNii)

    Articles in CiNii:1

    • Dual Damascene Integration Technology Featuring Short TAT Silylated Porous Silica (k=2.1) for 32nm node and beyond (2009)
  • TOMIOKA Kazuhiro ID: 9000256653858

    Overseas Business Division, Tacmina Corporation (2007 from CiNii)

    Articles in CiNii:1

    • What Makes OH-ike Irrigation Pond Eutrophic?:Investigation from the comparative study of OH-ike and SHIDANOSHITA-ike irrigation ponds (2007)
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