Search Results1-20 of  27

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  • Tsuda Hirotaka ID: 9000024939707

    Articles in CiNii:1

    • Atomic-scale cellular model and profile simulation of Si etching: analysis of profile anomalies and microscopic uniformity (Special issue: Dry process) (2010)
  • Tsuda Hirotaka ID: 9000024992029

    Articles in CiNii:1

    • Modeling and Simulation of Nanoscale Surface Rippling during Plasma Etching of Si under Oblique Ion Incidence (Special Issue : Dry Process) (2012)
  • Tsuda Hirotaka ID: 9000025014860

    Articles in CiNii:1

    • Three-dimensional atomic-scale cellular model and feature profile evolution during Si etching in chlorine-based plasmas: analysis of profile anomalies and surface roughness (Special issue: Plasma processing) (2011)
  • Tsuda Hirotaka ID: 9000025015476

    Articles in CiNii:1

    • Molecular dynamics analysis of the formation of surface roughness during Si etching in chlorine-based plasmas (Special issue: Dry process) (2011)
  • TSUDA Hirotaka ID: 9000107340932

    Department of Aeronautics and Astronautics, Graduate School of Engineering, Kyoto University (2009 from CiNii)

    Articles in CiNii:1

    • Molecular-Dynamics-Based Profile Evolution Simulation for Sub-10-nm Si Processing Technology (2009)
  • TSUDA Hirotaka ID: 9000240527005

    Kyushu Implant Research Group (2012 from CiNii)

    Articles in CiNii:1

    • A Case of Mandible Molar Intermediary Missing Treated by Dental Implants (2012)
  • TSUDA Hirotaka ID: 9000241689510

    Yokohama Fire Training and Research Center (1986 from CiNii)

    Articles in CiNii:2

    • A STUDY OF FIREMAN'S EQUIPAGE UNDER THERMAL CONDITION OF THE FIRE ATMOSPHERE (1986)
    • A STUDY ON THE PERFORMANCE EVALUATION OF FIREMEN'S BREATHING APPARATUS : A Comparative Experiment of the Open Circuit and the Closed Circuit Self-Contained Breathing Apparatus (1986)
  • TSUDA Hirotaka ID: 9000264874121

    Graduate School of Engineering, Kyoto University (2014 from CiNii)

    Articles in CiNii:2

    • Plasma Etch Challenges for Nanoscale ULSI Device Fabrication : Modeling and Simulation of Surface Roughening and Rippling during Plasma Etching of Si (2013)
    • Nanometer-Scale Surface Feature Fluctuation in Plasma Etching (2014)
  • Tsuda Hirotaka ID: 9000257944494

    Tokyo Denki University, School of Science and Engineering (2011 from CiNii)

    Articles in CiNii:1

    • Methods of Propagating and Storing Plants of Ceratopteris thalictroides through Encapsulation of Callus in Gel Beads (2011)
  • Tsuda Hirotaka ID: 9000277863720

    Articles in CiNii:1

    • Two modes of surface roughening during plasma etching of silicon: Role of ionized etch products (2014)
  • Tsuda Hirotaka ID: 9000279203213

    Articles in CiNii:1

    • Surface roughening and rippling during plasma etching of silicon: Numerical investigations and a comparison with experiments (2014)
  • Tsuda Hirotaka ID: 9000282391683

    Articles in CiNii:1

    • Two modes of surface roughening during plasma etching of silicon: role of ionized etch products (2014)
  • Tsuda Hirotaka ID: 9000282391687

    Articles in CiNii:1

    • Surface roughening and rippling during plasma etching of silicon: numerical investigations and a comparison with experiments (2014)
  • Tsuda Hirotaka ID: 9000336038186

    Articles in CiNii:1

    • Surface smoothing during plasma etching of Si in Cl2 (2016)
  • Tsuda Hirotaka ID: 9000337098278

    Articles in CiNii:1

    • Surface smoothing during plasma etching of Si in Cl2 (2016)
  • Tsuda Hirotaka ID: 9000392844764

    Articles in CiNii:1

    • Ripple formation on Si surfaces during plasma etching in Cl2 (2018)
  • Tsuda Hirotaka ID: 9000398552598

    Articles in CiNii:1

    • Origin of plasma-induced surface roughening and ripple formation during plasma etching: The crucial role of ion reflection (2018)
  • Tsuda Hirotaka ID: 9000398798824

    Articles in CiNii:1

    • Origin of plasma-induced surface roughening and ripple formation during plasma etching: The crucial role of ion reflection (2018)
  • Tsuda Hirotaka ID: 9000398798835

    Articles in CiNii:1

    • Ripple formation on Si surfaces during plasma etching in Cl2 (2018)
  • Tsuda Hirotaka ID: 9000401790698

    Articles in CiNii:1

    • Atomic-Scale Cellular Model and Profile Simulation of Si Etching: Analysis of Profile Anomalies and Microscopic Uniformity (2010)
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